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2023-01-16T03:50:00Z
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Absolute density and reaction kinetics of fluorine atoms in high-density c-C_4F_8 plasmas
Sasaki, K.
Kawai, Y.
Suzuki, C.
Kadota, K.
open access
Copyright (1998) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.
Absolute density and reaction kinetics of fluorine (F) atoms in high-density octafluorocyclobutane (c-C_4F_8) plasmas were examined using vacuum ultraviolet absorption spectroscopy. The F atom densities, corresponding to electron densities ranging from 1*10^11 to 5*10^12 cm^-3, were 1 *10^12-5*10^13 cm^-3 for gas pressures of 2-7 mTorr and rf powers of 0.2-1.5 kW. The F atom density was linearly dependent on the electron density for n_e<1.5*10^12 cm^-3. According to lifetime measurements in the afterglow, two decay processes were found in the F atom density: exponential (first-order kinetics) and linear (zero-order kinetics) decay components. The linear-decay component became significant at high gas pressures. The time constant of the exponential-decay component ranged from 5 to 100 ms, which corresponds to surface loss probabilities of 10^-1-10^-3. The surface loss probability varied inversely with the F atom density.
American Institute of Physics
1998-06-15
eng
journal article
VoR
http://hdl.handle.net/2237/7029
https://nagoya.repo.nii.ac.jp/records/5425
https://doi.org/10.1063/1.367511
0021-8979
Journal of Applied Physics
83
12
7482
7487
https://nagoya.repo.nii.ac.jp/record/5425/files/JApplPhys_83_7482.pdf
application/pdf
140.8 kB
2018-02-19