2024-03-28T19:17:41Z
https://nagoya.repo.nii.ac.jp/oai
oai:nagoya.repo.nii.ac.jp:00018730
2023-01-16T04:07:32Z
320:321:322
Growth and structure of an ultrathin tin oxide film on Rh (111)
Yuhara, J.
Tajima, D.
Matsui, T.
Tatsumi, K.
Muto, S.
Schmid, M.
Varga, P.
open access
© 2011 American Institute of Physics
Tin
Thin film structure
Oxide surfaces
Scanning tunneling microscopy
Surface structure
The oxidation of submonolayer tin films on a Rh(111) surface by O2 gas was studied using low energy electron diffraction, Auger electron spectroscopy, x-ray photoemission spectroscopy(XPS), and scanning tunneling microscopy. A uniform tin oxide monolayer film formed at oxidation temperatures around 500 °C and a partial pressure of 2×10−7 mbar O2. The tin oxide film had (2×2) periodicity on the Rh(111) surface, and the resulting tin coverage was determined to be 0.5 ML. Using XPS, the compositional ratio O/Sn was determined to be 3/2. XPS spectra showed a single component for the Sn and O peaks, indicating a uniform bonding environment. Finally, ab initio density-functional theory total energy calculations and molecular dynamics simulations were performed using the projector augmented wave method to determine the detailed structure of the tin oxide thin film.
AIP Publishing
2011-01
eng
journal article
VoR
http://hdl.handle.net/2237/20826
https://nagoya.repo.nii.ac.jp/records/18730
https://doi.org/10.1063/1.3537871
0021-8979
Journal of Applied Physics
109
2
024903
024903
https://nagoya.repo.nii.ac.jp/record/18730/files/1_3537871.pdf
application/pdf
1.2 MB
2018-02-21