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2023-01-16T03:49:57Z
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Absolute density measurement of cyanogen fluoride in CHF_3/N_2 electron cyclotron resonance plasma using infrared diode laser absorption spectroscopy
Miyata, Koji
13907
Arai, Hiroyoshi
13908
Hori, Masaru
13909
Goto, Toshio
13910
The absolute density of the cyanogen fluoride (FCN) molecule has been measured in a CHF_3 /N_2 electron-cyclotron-resonance (ECR) plasma using infrared diode laser absorption spectroscopy. The R(22) rotational-vibrational line at 1060.340 cm^-1 in the ν_1 fundamental of ^19F^12C^14N was used for the spectroscopy. The extinction process of FCN in the afterglow was discussed on the basis of the decay rate after discharge termination. Moreover, the absolute FCN density in a CHF_3 ECR plasma during etching of silicon nitride has been calculated on the basis of the data shown in our previous study [K. Miyata et al., J. Vac. Sci. Technol. A 15, 568 (1997)]. It was found that approximately 10% of nitrogen atoms coming from silicon nitride formed FCN.
journal article
American Institute of Physics
1997-11-15
application/pdf
Journal of Applied Physics
10
82
4777
4780
http://hdl.handle.net/2237/7027
0021-8979
https://nagoya.repo.nii.ac.jp/record/5423/files/JApplPhys_82_4777.pdf
eng
https://doi.org/10.1063/1.366335
Copyright (1997) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.