2024-03-29T06:54:05Z
https://nagoya.repo.nii.ac.jp/oai
oai:nagoya.repo.nii.ac.jp:00005473
2023-01-16T03:50:07Z
320:321:322
Formation and micromachining of Teflon (fluorocarbon polymer) film by a completely dry process using synchrotron radiation
Inayoshi, Muneto
14115
Ito, Masafumi
14116
Hori, Masaru
14117
Goto, Toshio
14118
Hiramatsu, Mineo
14119
The development of a new fabrication technique of Teflon microparts using synchrotron radiation (SR) irradiation, the SR ablation process, was described. The anisotropic micromachining and thin film formation of polytetrafluoroethylene, fluorinated ethylene propylene, and perfluoroalkoxy were demonstrated using the SR ablation process. The anisotropic micromachining of Teflon with hole pattern of 2 μm diam was successfully performed, and the micromachining of Teflon with a high aspect ratio of 50 was achieved. Moreover, Teflon films with flat surface were formed at a high rate by the SR ablation of Teflon at the substrate temperature above 200 ℃.
journal article
American Institute of Physics
1999-05
application/pdf
Journal of Vacuum Science & Technology B
3
17
949
956
http://hdl.handle.net/2237/7078
1071-1023
https://nagoya.repo.nii.ac.jp/record/5473/files/JVB000949.pdf
eng
https://doi.org/10.1116/1.590675
Copyright (1999) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.