2024-03-29T05:52:57Z
https://nagoya.repo.nii.ac.jp/oai
oai:nagoya.repo.nii.ac.jp:00007354
2023-01-16T03:52:53Z
320:321:322
Improvement of Mechanical Properties of Ti/TiN Multilayer Film Deposited by Sputtering
Ti/TiN スパッタリング薄膜の多層化につれての機械的特性の向上
森, 敏彦
20390
MORI, Toshihiko
20391
福田, 俊一
20392
FUKUDA, Syun'ichi
20393
竹村, 嘉彦
20394
TAKEMURA, Yoshihiko
20395
Coating
Laminated Construction
Composite Material
Hardness
Crystal Plasticity
Multilayer Film
Ti/TiN
Magnetron Sputtering
Silicone Substrate
Energy Method
Increasing requirements on coating properties results in trends to develop new systems, the most important of which is a multilayer coating. Multilayer coating can solve simultaneously very different requirements that the coating can meet at both the substrate /coating interface and the upper functional layer of the coating. Ti/TiN multilayer coatings were deposited on a silicon (100) by rf magnetron sputtering, using multi S-guns. Under the condition in which the total thickness kept 150 nm, the numbers of layers were changed from 4 to 40. Mechanical properties of a film were improved by straining and preferable crystalline orientation. Energy evolved in the coating during its growth can dissipate, and this may decrease internal stresses in the coating, improve its resistance to mechanical loadings, and prevent breaking of the coating. A mechanism of improving mechanical properties with increase of a layer number was discussed based on various analyses and measurements-that is, auger electron spectroscopy, x ray diffraction, nano-indenting test, scratch test and atomic force microscopy. Suppose that the overall energy W_hkl of multilayer film with constant overall thickness is the sum of the surface or interface energy S_hkl and strain energy U_hkl, (W_hkl=S_hkl+nU_hkl,where n is layer number), the preferred orientation of the film grown by physical vapor deposition is decided by the lowest conditions W_hkl resulting from a critical competition between S_hkl and U_hkl. Therefore a film should exhibit preferred orientation of the lowest U_hkl at small n but exhibit that of the lowest S_hkl at large n. The preferred orientation of the lowest U_hkl at small n but exhibit that of the lowest S_hkl at large n. The preferred orientation is predicted to change from (111) to (100) with increase of layer number because S(100)<S(111) and U(100)>U(111). XRD gives expected result. Relative strenghts δ/τ along [100] and [111] can be estimated for the slip system of TiN, {100}<110>, by using Schmid's law.
journal article
日本機械学会
2000-07
application/pdf
日本機械学會論文集 C編
647
66
2409
2416
http://hdl.handle.net/2237/9035
0387-5024
https://nagoya.repo.nii.ac.jp/record/7354/files/JsMecEngC_66-647-2409.pdf
jpn
http://ci.nii.ac.jp/naid/110002383215/
日本機械学会
本文データは学協会の許諾に基づきCiNiiから複製したものである。