@article{oai:nagoya.repo.nii.ac.jp:00010792,
 author = {Kato, T and Iwata, S and Yamauchi, Y and Tsunashima, S and Matsumoto, K and Morikawa, T and Ozaki, K},
 issue = {7},
 journal = {JOURNAL OF APPLIED PHYSICS},
 month = {Mar},
 note = {Planar patterned media using CrPt3 ordered alloy films were fabricated by Ar^+ or Kr^+ ion irradiation through nanoimprinted or electron beam lithography made masks. CrPt3 ordered alloy film on fused quartz substrate exhibits a large perpendicular anisotropy of 5×10^6 erg/cc and a large coercivity of 12 kOe, and we found that its magnetic order (magnetization) was completely suppressed by a quite low Ar^+ or Kr^+ ion dose of about 1–2×10^14 ions/cm^2. Magnetic force microscope image of the ion-beam patterned CrPt3 with a bit size of 90×90 nm showed clear magnetic contrast in nonirradiated regions, while no magnetic contrast in irradiated regions. The read-back waveform taken from an ion-beam patterned CrPt3 disk with 600 nm patterning pitch showed sharp signal transition between irradiated and nonirradiated regions, which indicates the possibility of high-density planar patterned media using CrPt3 ordered alloy.},
 title = {Planar patterned media fabricated by ion irradiation into CrPt3 ordered alloy films},
 volume = {105},
 year = {2009}
}