{"created":"2021-03-01T06:17:40.008668+00:00","id":10814,"links":{},"metadata":{"_buckets":{"deposit":"45462e60-9595-4478-a83e-c77c20b3f20b"},"_deposit":{"id":"10814","owners":[],"pid":{"revision_id":0,"type":"depid","value":"10814"},"status":"published"},"_oai":{"id":"oai:nagoya.repo.nii.ac.jp:00010814","sets":["320:321:322"]},"author_link":["32494","32495","32496","32497","32498"],"item_10_alternative_title_19":{"attribute_name":"その他のタイトル","attribute_value_mlt":[{"subitem_alternative_title":"Development of an Orientation-Dependent Anisotropic Etching Simulation System 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