{"created":"2021-03-01T06:18:07.314489+00:00","id":11242,"links":{},"metadata":{"_buckets":{"deposit":"42343ecc-716a-4f0b-9803-f0b3e5986879"},"_deposit":{"id":"11242","owners":[],"pid":{"revision_id":0,"type":"depid","value":"11242"},"status":"published"},"_oai":{"id":"oai:nagoya.repo.nii.ac.jp:00011242","sets":["320:1092:1093"]},"author_link":["34082","34083","34084"],"item_1618209983323":{"attribute_name":"助成情報","attribute_value_mlt":[{"subitem_award_numbers":{"subitem_award_number":"11305004","subitem_award_uri":"https://kaken.nii.ac.jp/ja/grant/KAKENHI-PROJECT-11305004"},"subitem_award_titles":[{"subitem_award_title":"電子温度制御プラズマによるラジカルの単色化に関する研究","subitem_award_title_language":"ja"}],"subitem_funder_identifiers":{"subitem_funder_identifier":"https://doi.org/10.13039/501100001691","subitem_funder_identifier_type":"Crossref Funder"},"subitem_funder_names":[{"subitem_funder_name":"日本学術振興会","subitem_funder_name_language":"ja"}]}]},"item_19_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2002-03","bibliographicIssueDateType":"Issued"}}]},"item_19_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"プラズマ中のラジカルの単色化をガスとプラズマとの組み合わせによって、実現し、下記の成果を得た。 1.電子ビーム励起プラズマ(EBEP)により窒素プラズマを生成し、励起電流と加速電圧により窒素ラジカル密度の直接制御が可能であり、極低圧下での高密度窒素ラジカル源として非常に有効であることが明らかとなった。さらに、多孔グリッドを用いた小型のEBEPを開発し、極低圧下での高密度窒素ラジカル源のみではなくダイヤモンドライクカーボン(DLC)の成膜プロセスやガラス基板の表面クリーニングプロセスへの応用を図り、ポリマー成分の少ない特性の DLCのCVD成膜を電気的に浮いたディスク基板の両面に行うことに成功した。 2.ダイヤモンドプロセスにおいてはCH_3、H、OHラジカル等をCラジカルに対して密度を増やす(単色化する)ことと、イオンに対する中性ラジカルの比を制御することで1.3Paという低圧力においてナノ結晶ダイヤモンドの合成にはじめて成功した。 3.微結晶シリコンプロセスにおいては、UHF帯(500MHz)のシラン/水素プラズマにおいて、0.5eVの低電子温度を実現し、プラズマをパルス変調することによってHラジカルに対するSiラジカルの比(Si/H)が精密に制御できることを見出した。また、Si/H比の制御とSiH_3/H比の制御により、微結晶シリコン膜の結晶化率と結晶配向性の両者を制御できることを見出した。これにより、結晶化率94%で(111)あるいは(220)配向を有する多結晶シリコン薄膜を合成することに成功した。 4.低誘電率有機薄膜極微細加工プロセスおいては、500MHzのUHF帯プラズマを用いることにより従来の13.56MHzのプラズマに対して N_2/H_2/NH_3プラズマ中でNラジカル密度を飛躍的に増加できることを見出し、この単色化ラジカルプロセスを用いることにより低誘電率有機薄膜の異方性極微細加工を実現した。","subitem_description_language":"ja","subitem_description_type":"Abstract"}]},"item_19_description_5":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"科学研究費補助金 研究種目:基盤研究(A)(2) 課題番号:11305004 研究代表者:後藤 俊夫 研究期間:1999-2001年度","subitem_description_language":"ja","subitem_description_type":"Other"}]},"item_19_identifier_60":{"attribute_name":"URI","attribute_value_mlt":[{"subitem_identifier_type":"HDL","subitem_identifier_uri":"http://hdl.handle.net/2237/13114"}]},"item_19_relation_40":{"attribute_name":"シリーズ","attribute_value_mlt":[{"subitem_relation_name":[{"subitem_relation_name_text":"科学研究費補助金報告書;基盤研究(A)(2);"}]}]},"item_19_select_15":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_select_item":"publisher"}]},"item_19_text_14":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_text_value":"application/pdf"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_abf2"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"後藤, 俊夫","creatorNameLang":"ja"}],"nameIdentifiers":[{"nameIdentifier":"34082","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"堀, 勝","creatorNameLang":"ja"}],"nameIdentifiers":[{"nameIdentifier":"34083","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"伊藤, 昌文","creatorNameLang":"ja"}],"nameIdentifiers":[{"nameIdentifier":"34084","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2018-02-20"}],"displaytype":"detail","filename":"11305004.pdf","filesize":[{"value":"3.2 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production","subitem_subject_scheme":"Other"},{"subitem_subject":"エッチング","subitem_subject_scheme":"Other"},{"subitem_subject":"プラズマ","subitem_subject_scheme":"Other"},{"subitem_subject":"プロセス","subitem_subject_scheme":"Other"},{"subitem_subject":"ラジカル","subitem_subject_scheme":"Other"},{"subitem_subject":"単色化","subitem_subject_scheme":"Other"},{"subitem_subject":"気相反応","subitem_subject_scheme":"Other"},{"subitem_subject":"電子温度","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"research 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