{"created":"2021-03-01T06:18:56.264993+00:00","id":12007,"links":{},"metadata":{"_buckets":{"deposit":"6adb413f-249b-4bca-9576-3285cce3f98b"},"_deposit":{"id":"12007","owners":[],"pid":{"revision_id":0,"type":"depid","value":"12007"},"status":"published"},"_oai":{"id":"oai:nagoya.repo.nii.ac.jp:00012007","sets":["320:321:322"]},"author_link":["38042","38043","38044","38045","38046","38047","38048","38049","38050"],"control_number":"12007","item_10_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2009-12","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"6","bibliographicPageEnd":"1356","bibliographicPageStart":"1345","bibliographicVolumeNumber":"18","bibliographic_titles":[{"bibliographic_title":"Journal of Microelectromechanical Systems, IEEE","bibliographic_titleLang":"en"}]}]},"item_10_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"This paper focuses on two aspects, macroscopic and microscopic, of pure and surfactant-added tetramethylammonium hydroxide (TMAH) wet etching. The macroscopic aspects deal with the technological/engineering applications of pure and surfactant-added TMAH for the fabrication of microelectromechanical systems (MEMS). The microscopic view is focused on the in situ observation of the silicon surface during etching in pure and surfactant-added TMAH solutions using Fourier transform infrared (FT-IR) spectroscopy in the multiple internal reflection geometry. The latter is primarily aimed at investigating the causes behind the change in the orientation-dependent etching behavior of TMAH solution when the surfactant is added. Silicon prisms having two different orientations ({110} and {100}) were prepared for comparison of the amount of adsorbed surfactant using FT-IR. Stronger and weaker adsorptions were observed on {110} and {100}, respectively. Moreover, ellipsometric spectroscopy (ES) measurements of surfactant adsorption depending on the crystallographic orientation are also performed in order to gain further information about the differences in the silicon-surfactant interface for Si{100} and Si{110}. In this paper, we determine the differences in surfactant adsorption characteristics for Si{110} and Si{100} using FT-IR and ES measurements for the first time, focusing both on the mechanism and on the technological/engineering applications in MEMS.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_10_identifier_60":{"attribute_name":"URI","attribute_value_mlt":[{"subitem_identifier_type":"HDL","subitem_identifier_uri":"http://hdl.handle.net/2237/13883"}]},"item_10_publisher_32":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"IEEE","subitem_publisher_language":"en"}]},"item_10_relation_11":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type":"isVersionOf","subitem_relation_type_id":{"subitem_relation_type_id_text":"https://doi.org/10.1109/JMEMS.2009.2031688","subitem_relation_type_select":"DOI"}}]},"item_10_rights_12":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"©2009 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.","subitem_rights_language":"en"}]},"item_10_select_15":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_select_item":"publisher"}]},"item_10_source_id_7":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"1057-7157","subitem_source_identifier_type":"PISSN"}]},"item_10_text_14":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_text_value":"application/pdf"}]},"item_1615787544753":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_abf2"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Pal, Prem","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"38042","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Sato, Kazuo","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"38043","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Gosalvez, Miguel A","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"38044","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Kimura, Yasuo","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"38045","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Ishibashi, Ken-Ichi","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"38046","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Niwano, Michio","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"38047","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Hida, Hirotaka","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"38048","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Tang, Bin","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"38049","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Itoh, Shintaro","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"38050","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2018-02-20"}],"displaytype":"detail","filename":"Prem_Pal.pdf","filesize":[{"value":"1.5 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"Prem_Pal.pdf","objectType":"fulltext","url":"https://nagoya.repo.nii.ac.jp/record/12007/files/Prem_Pal.pdf"},"version_id":"0ad483c6-ef03-4c3d-87b4-675ef6730fd1"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Surfactant Adsorption on Single-Crystal Silicon Surfaces in TMAH Solution: Orientation-Dependent Adsorption Detected by In Situ Infrared Spectroscopy","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Surfactant Adsorption on Single-Crystal Silicon Surfaces in TMAH Solution: Orientation-Dependent Adsorption Detected by In Situ Infrared Spectroscopy","subitem_title_language":"en"}]},"item_type_id":"10","owner":"1","path":["322"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2010-07-29"},"publish_date":"2010-07-29","publish_status":"0","recid":"12007","relation_version_is_last":true,"title":["Surfactant Adsorption on Single-Crystal Silicon Surfaces in TMAH Solution: Orientation-Dependent Adsorption Detected by In Situ Infrared Spectroscopy"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-01-16T03:58:39.199393+00:00"}