{"created":"2021-03-01T06:19:32.238508+00:00","id":12570,"links":{},"metadata":{"_buckets":{"deposit":"8faea017-29a8-4cc1-b0ef-f81e250a05a3"},"_deposit":{"id":"12570","owners":[],"pid":{"revision_id":0,"type":"depid","value":"12570"},"status":"published"},"_oai":{"id":"oai:nagoya.repo.nii.ac.jp:00012570","sets":["320:321:322"]},"author_link":["39524","39525","39526","39527","39528"],"item_10_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2010-06","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"6","bibliographicPageEnd":"1674","bibliographicPageStart":"1671","bibliographicVolumeNumber":"46","bibliographic_titles":[{"bibliographic_title":"Magnetics, IEEE Transactions on","bibliographic_titleLang":"en"}]}]},"item_10_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"SiO2 (2 nm) / Cr25Pt75 (15 nm) and SiO2 (2 nm) / Cr25Pt75 (15 nm) / SiO2 (10, 20 nm) / Co80Zr10Nb10 (10 nm) were prepared by magnetron sputtering method and post-annealed by rapid thermal annealing (RTA) at temperatures of 600 – 1000 ˚C for 1 – 60 sec. The saturation magnetization Ms and coercivity Hc measured by applying a maximum field of 18 kOe were 150 emu/cc and 12 kOe, respectively, for the sample after RTA at 1000 ˚C for 30 sec. This means that L12-CrPt3 phase was obtained by RTA process.  The RTA process was applied to fabricate the multilayered structure having L12-CrPt3 and CoZrNb soft magnetic underlayer (SUL). The polar Kerr loop of CrPt3 (15 nm) / SiO2 (20 nm) / CoZrNb (10 nm) after RTA at 1000 ˚C for 30 sec exhibited a large coercivity Hc > 9 kOe corresponding to that of the CrPt3 single layer. From the compositional depth profile of CrPt3 (15 nm) / SiO2 (20 nm) / CoZrNb (10 nm) processed by RTA at 1000 ˚C for 30 sec, sharp layered structure was confirmed despite the high temperature heat treatment. When the SiO2 thickness was reduced to 10 nm, such a layered structure was completely destroyed due to the interdiffusion between CrPt3 and CoZrNb layers. Thus it was concluded that the RTA process and the interlayer of SiO2 (20 nm) were effective to fabricate layered structure having L12-CrPt3 and SUL.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_10_identifier_60":{"attribute_name":"URI","attribute_value_mlt":[{"subitem_identifier_type":"HDL","subitem_identifier_uri":"http://hdl.handle.net/2237/14454"},{"subitem_identifier_type":"DOI","subitem_identifier_uri":"http://dx.doi.org/10.1109/TMAG.2010.2044559"}]},"item_10_publisher_32":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"IEEE","subitem_publisher_language":"en"}]},"item_10_relation_11":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type":"isVersionOf","subitem_relation_type_id":{"subitem_relation_type_id_text":"https://doi.org/10.1109/TMAG.2010.2044559","subitem_relation_type_select":"DOI"}}]},"item_10_rights_12":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"© 2011 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.","subitem_rights_language":"en"}]},"item_10_select_15":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_select_item":"author"}]},"item_10_source_id_7":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"0018-9464","subitem_source_identifier_type":"PISSN"}]},"item_1615787544753":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_abf2"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Kato, Takeshi","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"39524","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Oshima, Daiki","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"39525","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Yamauchi, Yukihiro","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"39526","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Iwata, Satoshi","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"39527","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Tsunashima, Shigeru","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"39528","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2018-02-20"}],"displaytype":"detail","filename":"1046.pdf","filesize":[{"value":"1.7 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"1046.pdf","objectType":"fulltext","url":"https://nagoya.repo.nii.ac.jp/record/12570/files/1046.pdf"},"version_id":"5fa3c012-689f-4753-9df5-ea23eed909ba"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Rapid thermal annealing","subitem_subject_scheme":"Other"},{"subitem_subject":"Magnetic layered films","subitem_subject_scheme":"Other"},{"subitem_subject":"planar bit patterned media","subitem_subject_scheme":"Other"},{"subitem_subject":"CrPt3","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Fabrication of L12-CrPt3 Alloy Films Using Rapid Thermal Annealing for Planar Bit Patterned Media","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Fabrication of L12-CrPt3 Alloy Films Using Rapid Thermal Annealing for Planar Bit Patterned Media","subitem_title_language":"en"}]},"item_type_id":"10","owner":"1","path":["322"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2011-02-09"},"publish_date":"2011-02-09","publish_status":"0","recid":"12570","relation_version_is_last":true,"title":["Fabrication of L12-CrPt3 Alloy Films Using Rapid Thermal Annealing for Planar Bit Patterned Media"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-01-16T03:49:47.991262+00:00"}