@article{oai:nagoya.repo.nii.ac.jp:00018730,
 author = {Yuhara, J. and Tajima, D. and Matsui, T. and Tatsumi, K. and Muto, S. and Schmid, M. and Varga, P.},
 issue = {2},
 journal = {Journal of Applied Physics},
 month = {Jan},
 note = {The oxidation of submonolayer tin films on a Rh(111) surface by O2 gas was studied using low energy electron diffraction, Auger electron spectroscopy, x-ray photoemission spectroscopy(XPS), and scanning tunneling microscopy. A uniform tin oxide monolayer film formed at oxidation temperatures around 500 °C and a partial pressure of 2×10−7 mbar O2. The tin oxide film had (2×2) periodicity on the Rh(111) surface, and the resulting tin coverage was determined to be 0.5 ML. Using XPS, the compositional ratio O/Sn was determined to be 3/2. XPS spectra showed a single component for the Sn and O peaks, indicating a uniform bonding environment. Finally, ab initio density-functional theory total energy calculations and molecular dynamics simulations were performed using the projector augmented wave method to determine the detailed structure of the tin oxide thin film.},
 pages = {024903--024903},
 title = {Growth and structure of an ultrathin tin oxide film on Rh (111)},
 volume = {109},
 year = {2011}
}