{"created":"2021-09-10T02:07:45.230387+00:00","id":2001420,"links":{},"metadata":{"_buckets":{"deposit":"42aafe33-64aa-4be2-9bf5-0d71bc455c3c"},"_deposit":{"created_by":17,"id":"2001420","owner":"17","owners":[17],"owners_ext":{"displayname":"図書情報係","username":"repository"},"pid":{"revision_id":0,"type":"depid","value":"2001420"},"status":"published"},"_oai":{"id":"oai:nagoya.repo.nii.ac.jp:02001420","sets":["320:321:322"]},"author_link":[],"control_number":"2001420","item_1615768549627":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_1629683748249":{"attribute_name":"日付","attribute_value_mlt":[{"subitem_date_issued_datetime":"2022-01-01","subitem_date_issued_type":"Available"}]},"item_9_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2021-01","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"1","bibliographicPageStart":"016001","bibliographicVolumeNumber":"60","bibliographic_titles":[{"bibliographic_title":"Japanese Journal of Applied Physics","bibliographic_titleLang":"en"}]}]},"item_9_description_4":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"Charging and discharging behavior of high aspect-ratio (AR) hole capillary plate (CP) exposed to a pulse-modulated very high frequency (VHF) capacitively-coupled plasma is investigated. From an equivalent circuit model, time-dependent charge density on the bottom of the CP is quantitatively evaluated. AR of the CP plays very important role for the charging current, although the discharge current is dominated by the leakage current of the CP. Importance of electron current flowing into the CP bottom during the VHF pulse-on phase is suggested at higher self-bias voltages.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_9_publisher_32":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"IOP publishing","subitem_publisher_language":"en"}]},"item_9_relation_43":{"attribute_name":"関連情報","attribute_value_mlt":[{"subitem_relation_type":"isVersionOf","subitem_relation_type_id":{"subitem_relation_type_id_text":"https://doi.org/10.35848/1347-4065/abd0ca","subitem_relation_type_select":"DOI"}}]},"item_9_rights_12":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"This is the Accepted Manuscript version of an article accepted for publication in [Japanese Journal of Applied Physics]. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at [https://doi.org/10.35848/1347-4065/abd0ca]","subitem_rights_language":"en"}]},"item_9_source_id_7":{"attribute_name":"収録物識別子","attribute_value_mlt":[{"subitem_source_identifier":"0021-4922","subitem_source_identifier_type":"PISSN"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_abf2"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Moriyama, Makoto","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Nakahara, Naoya","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Kurihara, Kazuaki","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Iino, Daiki","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Fukumizu, Hiroyuki","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Suzuki, Haruka","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Toyoda, Hirotaka","creatorNameLang":"en"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2022-01-01"}],"displaytype":"detail","filename":"repository_moriyama.pdf","filesize":[{"value":"1.1 MB"}],"format":"application/pdf","mimetype":"application/pdf","url":{"objectType":"fulltext","url":"https://nagoya.repo.nii.ac.jp/record/2001420/files/repository_moriyama.pdf"},"version_id":"218ad4a6-207b-4bfa-bf5d-846a46eae437"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"high-aspect hole","subitem_subject_scheme":"Other"},{"subitem_subject":"charge-up","subitem_subject_scheme":"Other"},{"subitem_subject":"VHF plasma","subitem_subject_scheme":"Other"},{"subitem_subject":"pulse-modulated plasma","subitem_subject_scheme":"Other"},{"subitem_subject":"charging current","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Time-dependent measurement of charge density on the bottom of high aspect capillary hole in pulse-modulated VHF capacitively coupled Ar plasma","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Time-dependent measurement of charge density on the bottom of high aspect capillary hole in pulse-modulated VHF capacitively coupled Ar plasma","subitem_title_language":"en"}]},"item_type_id":"40001","owner":"17","path":["322"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2021-09-10"},"publish_date":"2021-09-10","publish_status":"0","recid":"2001420","relation_version_is_last":true,"title":["Time-dependent measurement of charge density on the bottom of high aspect capillary hole in pulse-modulated VHF capacitively coupled Ar plasma"],"weko_creator_id":"17","weko_shared_id":-1},"updated":"2023-01-16T05:14:50.268428+00:00"}