@article{oai:nagoya.repo.nii.ac.jp:02002045,
 author = {Bae, Hansin and Sasai, Kensuke and Suzuki, Haruka and Toyoda, Hirotaka},
 journal = {Vacuum},
 month = {Oct},
 note = {A method for graphite-like carbon (GLC) deposition using Ar/C6H6 surface-wave plasma (SWP) is proposed. Characteristic of the SWP, i.e., high plasma density with wide spatial uniformity realized uniform carbon film deposition at high deposition rates. To increase sp^2 ratio in carbon films, a pulsed negative bias voltage up to ~2 kV is applied to a substrate. Conductive carbon films of low sheet resistances below ~10^2 Ω/sq is achieved at high deposition rates up to ~6 nm/s with good spatial uniformity (5%) in an area of ~183 cm^2. Film structure is evaluated by Raman spectroscopy, Fourier-transform infra-red spectroscopy, X-ray diffraction, X-ray photoelectron spectroscopy, scanning transmission electron microscopy and electron energy loss spectroscopy. At high negative bias voltages, sp^2-rich with reduced hydrogen content of the film is observed.},
 title = {High-speed deposition of graphite-like carbon film by Ar/C6H6 surface-wave plasma with high-voltage pulse biasing},
 volume = {192},
 year = {2021}
}