{"created":"2022-02-08T00:39:48.793766+00:00","id":2002045,"links":{},"metadata":{"_buckets":{"deposit":"7d609b34-968e-498f-84ca-1a138df51231"},"_deposit":{"created_by":17,"id":"2002045","owner":"17","owners":[17],"owners_ext":{"displayname":"\u56f3\u66f8\u60c5\u5831\u4fc2","username":"repository"},"pid":{"revision_id":0,"type":"depid","value":"2002045"},"status":"published"},"_oai":{"id":"oai:nagoya.repo.nii.ac.jp:02002045"},"author_link":[],"item_1615768549627":{"attribute_name":"\u51fa\u7248\u30bf\u30a4\u30d7","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_1629683748249":{"attribute_name":"\u65e5\u4ed8","attribute_value_mlt":[{"subitem_date_issued_datetime":"2023-10-01","subitem_date_issued_type":"Available"}]},"item_9_biblio_info_6":{"attribute_name":"\u66f8\u8a8c\u60c5\u5831","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2021-10","bibliographicIssueDateType":"Issued"},"bibliographicPageStart":"110429","bibliographicVolumeNumber":"192","bibliographic_titles":[{"bibliographic_title":"Vacuum","bibliographic_titleLang":"en"}]}]},"item_9_description_4":{"attribute_name":"\u5185\u5bb9\u8a18\u8ff0","attribute_value_mlt":[{"subitem_description":"A method for graphite-like carbon (GLC) deposition using Ar/C6H6 surface-wave plasma (SWP) is proposed. Characteristic of the SWP, i.e., high plasma density with wide spatial uniformity realized uniform carbon film deposition at high deposition rates. To increase sp^2 ratio in carbon films, a pulsed negative bias voltage up to ~2 kV is applied to a substrate. Conductive carbon films of low sheet resistances below ~10^2 \u03a9/sq is achieved at high deposition rates up to ~6 nm/s with good spatial uniformity (5%) in an area of ~183 cm^2. Film structure is evaluated by Raman spectroscopy, Fourier-transform infra-red spectroscopy, X-ray diffraction, X-ray photoelectron spectroscopy, scanning transmission electron microscopy and electron energy loss spectroscopy. At high negative bias voltages, sp^2-rich with reduced hydrogen content of the film is observed.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_9_publisher_32":{"attribute_name":"\u51fa\u7248\u8005","attribute_value_mlt":[{"subitem_publisher":"Elsevier","subitem_publisher_language":"en"}]},"item_9_relation_43":{"attribute_name":"\u95a2\u9023\u60c5\u5831","attribute_value_mlt":[{"subitem_relation_type":"isVersionOf","subitem_relation_type_id":{"subitem_relation_type_id_text":"https://doi.org/10.1016/j.vacuum.2021.110429","subitem_relation_type_select":"DOI"}}]},"item_9_rights_12":{"attribute_name":"\u6a29\u5229","attribute_value_mlt":[{"subitem_rights":"\u00a9 2021. This manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/","subitem_rights_language":"en"}]},"item_9_source_id_7":{"attribute_name":"\u53ce\u9332\u7269\u8b58\u5225\u5b50","attribute_value_mlt":[{"subitem_source_identifier":"0042-207X","subitem_source_identifier_type":"PISSN"}]},"item_access_right":{"attribute_name":"\u30a2\u30af\u30bb\u30b9\u6a29","attribute_value_mlt":[{"subitem_access_right":"embargoed access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_f1cf"}]},"item_creator":{"attribute_name":"\u8457\u8005","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Bae, Hansin","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Sasai, Kensuke","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Suzuki, Haruka","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Toyoda, Hirotaka","creatorNameLang":"en"}]}]},"item_files":{"attribute_name":"\u30d5\u30a1\u30a4\u30eb\u60c5\u5831","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2023-10-01"}],"displaytype":"detail","filename":"Final_Version_bae.pdf","filesize":[{"value":"985 KB"}],"format":"application/pdf","url":{"objectType":"fulltext","url":"https://nagoya.repo.nii.ac.jp/record/2002045/files/Final_Version_bae.pdf"},"version_id":"f1f3e19f-a82e-4763-91c6-8f367e96f20a"}]},"item_keyword":{"attribute_name":"\u30ad\u30fc\u30ef\u30fc\u30c9","attribute_value_mlt":[{"subitem_subject":"PECVD","subitem_subject_scheme":"Other"},{"subitem_subject":"Carbon","subitem_subject_scheme":"Other"},{"subitem_subject":"Conductive carbon film","subitem_subject_scheme":"Other"},{"subitem_subject":"Microwave plasma","subitem_subject_scheme":"Other"},{"subitem_subject":"Graphite-like carbon","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"\u8a00\u8a9e","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"\u8cc7\u6e90\u30bf\u30a4\u30d7","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"High-speed deposition of graphite-like carbon film by Ar/C6H6 surface-wave plasma with high-voltage pulse biasing","item_titles":{"attribute_name":"\u30bf\u30a4\u30c8\u30eb","attribute_value_mlt":[{"subitem_title":"High-speed deposition of graphite-like carbon film by Ar/C6H6 surface-wave plasma with high-voltage pulse biasing","subitem_title_language":"en"}]},"item_type_id":"40001","owner":"17","path":["320/321/322"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2022-02-08"},"publish_date":"2022-02-08","publish_status":"0","recid":"2002045","relation_version_is_last":true,"title":["High-speed deposition of graphite-like carbon film by Ar/C6H6 surface-wave plasma with high-voltage pulse biasing"],"weko_creator_id":"17","weko_shared_id":-1},"updated":"2022-02-08T00:48:04.575875+00:00"}