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  1. F200 未来材料・システム研究所
  2. F200a 雑誌掲載論文
  3. 学術雑誌

Microscopic identification of stepped SiC(0001) and the reaction site of hydrogen-rich epitaxial growth

http://hdl.handle.net/2237/0002004229
http://hdl.handle.net/2237/0002004229
06895378-fb00-4bfd-ada0-d01287eb3fa9
名前 / ファイル ライセンス アクション
PhysRevB_106_035309.pdf PhysRevB_106_035309.pdf (5.1 MB)
Item type itemtype_ver1(1)
公開日 2022-11-30
タイトル
タイトル Microscopic identification of stepped SiC(0001) and the reaction site of hydrogen-rich epitaxial growth
言語 en
著者 Kimura, Tomoya

× Kimura, Tomoya

en Kimura, Tomoya

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Chokawa, Kenta

× Chokawa, Kenta

en Chokawa, Kenta

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Shiraishi, Kenji

× Shiraishi, Kenji

en Shiraishi, Kenji

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Oshiyama, Atsushi

× Oshiyama, Atsushi

en Oshiyama, Atsushi

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アクセス権
アクセス権 open access
アクセス権URI http://purl.org/coar/access_right/c_abf2
権利
言語 en
権利情報 © 2022 American Physical Society
内容記述
内容記述 We report first-principles total-energy electronic-structure calculations, based on density-functional theory, that unveil detailed atomic structures of hydrogen-adsorbed step edges and their energetics of the silicon carbide (SiC) (0001) surface. The obtained adsorption energy of the hydrogen atom at each step reveals the microscopic reason for the step morphology on the Si-face SiC(0001) surfaces which are commonly inclined toward the ⟨11¯20⟩ direction in epitaxial growth. The calculated hydrogen coverages at each step and also on the surface terrace clearly identify the favorable reaction sites for the epitaxial growth, such as chemical vapor deposition (CVD) in which hydrogen is ubiquitous. The obtained results provide a firm theoretical framework to discuss the atom-scale mechanism of the epitaxial growth of SiC.
言語 en
内容記述タイプ Abstract
出版者
言語 en
出版者 American Physical Society
言語
言語 eng
資源タイプ
資源タイプresource http://purl.org/coar/resource_type/c_6501
タイプ journal article
出版タイプ
出版タイプ VoR
出版タイプResource http://purl.org/coar/version/c_970fb48d4fbd8a85
関連情報
関連タイプ isVersionOf
識別子タイプ DOI
関連識別子 https://doi.org/10.1103/PhysRevB.106.035309
収録物識別子
収録物識別子タイプ PISSN
収録物識別子 2469-9950
書誌情報 en : Physical Review B

巻 106, 号 3, p. 035309, 発行日 2022-07-15
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