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  1. B200 工学部/工学研究科
  2. B200a 雑誌掲載論文
  3. 学術雑誌

Improved Turn-On Voltage Controllability in AlGaN/GaN Gated-Anode Diodes Using Etch Endpoint Detection Layer

http://hdl.handle.net/2237/0002011707
http://hdl.handle.net/2237/0002011707
35380a1a-1fe3-47fd-b16e-36fc44b2c2e8
名前 / ファイル ライセンス アクション
FINAL_VERSION.pdf FINAL_VERSION.pdf (1.5 MB)
アイテムタイプ itemtype_ver1(1)
公開日 2024-11-22
タイトル
タイトル Improved Turn-On Voltage Controllability in AlGaN/GaN Gated-Anode Diodes Using Etch Endpoint Detection Layer
言語 en
著者 Ando, Yuji

× Ando, Yuji

en Ando, Yuji

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Oishi, Kensuke

× Oishi, Kensuke

en Oishi, Kensuke

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Takahashi, Hidemasa

× Takahashi, Hidemasa

en Takahashi, Hidemasa

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Makisako, Ryutaro

× Makisako, Ryutaro

en Makisako, Ryutaro

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Wakejima, Akio

× Wakejima, Akio

en Wakejima, Akio

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Suda, Jun

× Suda, Jun

en Suda, Jun

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アクセス権
アクセス権 open access
アクセス権URI http://purl.org/coar/access_right/c_abf2
権利
権利情報 “© 2024 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.”
言語 en
内容記述
内容記述タイプ Abstract
内容記述 AlGaN/GaN gated-anode diodes (GADs) have been proposed as microwave rectifying devices for microwave wireless power transmission (WPT) systems. However, achieving the desired turn-on voltage ( Von ) has posed a critical challenge due to the requirement for precise etching control. This article introduces a novel GAD structure aimed at enhancing productivity. In this new configuration, a GaN etch endpoint detection layer (GaN marker layer) is incorporated into the AlGaN layer, positioned approximately 4.5 nm away from the channel interface. During gate recess etching, the residual thickness of AlGaN is monitored using an optical interferometer. Etching is halted successfully upon detection of the GaN marker layer, signaled by an abrupt change in interference. Fabricated GADs consistently achieved the target Von of +0.20 V, exhibiting improved uniformity compared to prior GADs lacking a GaN marker layer. These devices typically demonstrated a maximum forward current of 0.69 A/mm and a reverse breakdown voltage exceeding 100 V. Additionally, a bridge-type rectifier circuit employing four GADs was simulated using a SPICE model constructed from measured pulse I–V characteristics and S-parameters. A conversion efficiency of 84% was predicted with an input power of 25.6 W (8 W/mm) at 5.8 GHz.
言語 en
出版者
出版者 IEEE
言語 en
言語
言語 eng
資源タイプ
資源タイプresource http://purl.org/coar/resource_type/c_6501
タイプ journal article
出版タイプ
出版タイプ AM
出版タイプResource http://purl.org/coar/version/c_ab4af688f83e57aa
関連情報
関連タイプ isVersionOf
識別子タイプ DOI
関連識別子 https://doi.org/10.1109/TED.2024.3381570
収録物識別子
収録物識別子タイプ PISSN
収録物識別子 0018-9383
書誌情報 en : IEEE Transactions on Electron Devices

巻 71, 号 5, p. 2936-2942, 発行日 2024-05
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