| アイテムタイプ |
itemtype_ver1(1) |
| 公開日 |
2024-12-09 |
| タイトル |
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タイトル |
Nitrogen admixture effects on growth characteristics and properties of carbon nanowalls |
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言語 |
en |
| 著者 |
Christy, Peter Raj Dennis
Ngo Van Nong
Britun, Nikolay
Ngo Quang Minh
Nguyen, Thi-Thuy-Nga
Kondo, Hiroki
Oda, Osamu
Ishikawa, Kenji
Hori, Masaru
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| アクセス権 |
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アクセス権 |
embargoed access |
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アクセス権URI |
http://purl.org/coar/access_right/c_f1cf |
| 権利 |
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権利情報 |
© 2024. This manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/ |
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言語 |
en |
| 内容記述 |
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内容記述タイプ |
Abstract |
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内容記述 |
The plasma functionalization of carbon nanowalls (CNWs) is of great interest due to their potential applications in electron field emission and energy storage devices. In this study, the effects of nitrogen on the growth and properties of CNWs are thoroughly investigated by varying a wide range of the N2 concentrations in the CH4/H2/N2 discharge plasma. Nitrogen-doped carbon nanowalls (N-CNWs) were synthesized in a single-step growth using the hydrogen radical injection plasma-enhanced chemical vapor deposition technique. The formation of dense N-CNWs was found to be enhanced by nitrogen and was three times higher in the sample with a 150 sccm N2 flow rate than in the sample without N2 addition (N-0). As the N2 concentration increased from 0 to 200 sccm, the morphology of CNWs changed from relatively straight to curly-like nanowall structures. A high-resolution optical emission spectroscopic observation shows that as N2 flow increased, CN radicals became the dominant species, suppressing the formation of C2 and CH. Photoelectron spectroscopy analysis revealed the nitrogen doping effect on graphene layers at high N2 concentrations. According to Raman and Transmission Electron Microscopy analyses, the N-CNWs had more branched and thicker nanowalls with higher defect concentrations than the N-0 sample. The wettability of N-CNWs was improved, particularly for the sample with a N2 flow rate of 150 sccm. |
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言語 |
en |
| 出版者 |
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出版者 |
Elsevier |
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言語 |
en |
| 言語 |
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言語 |
eng |
| 資源タイプ |
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資源タイプresource |
http://purl.org/coar/resource_type/c_6501 |
|
タイプ |
journal article |
| 出版タイプ |
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出版タイプ |
AM |
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出版タイプResource |
http://purl.org/coar/version/c_ab4af688f83e57aa |
| 関連情報 |
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関連タイプ |
isVersionOf |
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|
識別子タイプ |
DOI |
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関連識別子 |
https://doi.org/10.1016/j.tsf.2024.140322 |
| 収録物識別子 |
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収録物識別子タイプ |
PISSN |
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収録物識別子 |
00406090 |
| 書誌情報 |
en : Thin Solid Films
巻 795,
p. 140322,
発行日 2024-04-30
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| ファイル公開日 |
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日付 |
2026-04-30 |
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日付タイプ |
Available |
Manuscript_reviewed_NgoVanNong.pdf (2.8 MB)
