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  1. B200 工学部/工学研究科
  2. B200a 雑誌掲載論文
  3. 学術雑誌

Fabrication of microstrips of iron-based superconductor NdFeAs(O,H)

http://hdl.handle.net/2237/0002011777
http://hdl.handle.net/2237/0002011777
f3e2a090-971d-4fe2-a557-8672ed7ccfc3
名前 / ファイル ライセンス アクション
paper1_Revision.pdf paper1_Revision.pdf (447 KB)
アイテムタイプ itemtype_ver1(1)
公開日 2024-12-10
タイトル
タイトル Fabrication of microstrips of iron-based superconductor NdFeAs(O,H)
言語 en
著者 Yoshikawa, Atsuro

× Yoshikawa, Atsuro

en Yoshikawa, Atsuro

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Hatano, Takafumi

× Hatano, Takafumi

en Hatano, Takafumi

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Hibino, Hiroto

× Hibino, Hiroto

en Hibino, Hiroto

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Imanaka, Hiroya

× Imanaka, Hiroya

en Imanaka, Hiroya

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Ikuta, Hiroshi

× Ikuta, Hiroshi

en Ikuta, Hiroshi

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アクセス権
アクセス権 open access
アクセス権URI http://purl.org/coar/access_right/c_abf2
権利
権利情報 This is the Accepted Manuscript version of an article accepted for publication in [Superconductor Science and Technology]. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at [https://doi.org/10.1088/1361-6668/ad5b24]
言語 en
権利
権利情報 “This Accepted Manuscript is available for reuse under a CC BY-NC-ND licence after the 12 month embargo period provided that all the terms of the licence are adhered to”
言語 en
内容記述
内容記述タイプ Abstract
内容記述 NdFeAs(O,H) microstrips with line widths of about 1–5 µm were fabricated by photolithography and Ar-ion dry etching. The microstrips were fabricated under two different etching conditions: 25 min etching at a power of 20 W (long duration, low power) and 3 min etching at 100 W (short duration, high power). For both conditions, the narrowest microstrips, which were 0.9 µm in width, retained high critical temperatures of about 85% of those before microfabrication. Further, the 0.9 µm microstrip fabricated under the high-power, short-duration condition exhibited a high critical current density (Jc) of more than 4 MA cm^−2 at 4 K. However, Jc of the microstrip fabricated under the low-power, long-duration condition was somewhat lower. Our analysis suggests that the edges of the microstrips were damaged more than twice as wide as those of the microstrips fabricated under the high-power, short-duration condition. This indicates that a short duration is more effective to reduce the damage than using a lower etching power.
言語 en
出版者
出版者 IOP publishing
言語 en
言語
言語 eng
資源タイプ
資源タイプresource http://purl.org/coar/resource_type/c_6501
タイプ journal article
出版タイプ
出版タイプ AM
出版タイプResource http://purl.org/coar/version/c_ab4af688f83e57aa
関連情報
関連タイプ isVersionOf
識別子タイプ DOI
関連識別子 https://doi.org/10.1088/1361-6668/ad5b24
収録物識別子
収録物識別子タイプ PISSN
収録物識別子 0953-2048
書誌情報 en : Superconductor Science and Technology

巻 37, 号 8, p. 085008, 発行日 2024-08
ファイル公開日
日付 2025-08-01
日付タイプ Available
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