{"created":"2021-03-01T06:29:06.965197+00:00","id":21444,"links":{},"metadata":{"_buckets":{"deposit":"6f0dc4a4-5ee4-4b2e-8318-c265682e33bd"},"_deposit":{"id":"21444","owners":[],"pid":{"revision_id":0,"type":"depid","value":"21444"},"status":"published"},"_oai":{"id":"oai:nagoya.repo.nii.ac.jp:00021444","sets":["320:321:322"]},"author_link":["62274","62275","62276","62277","62278","62279","62280","62281","62282","62283","62284","62285"],"item_10_alternative_title_19":{"attribute_name":"その他のタイトル","attribute_value_mlt":[{"subitem_alternative_title":"Photoemission Study of Chemical Bonding Features at Metal/GeO_2 Interfaces","subitem_alternative_title_language":"en"}]},"item_10_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2011-06-27","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"114","bibliographicPageEnd":"68","bibliographicPageStart":"63","bibliographicVolumeNumber":"111","bibliographic_titles":[{"bibliographic_title":"電子情報通信学会技術研究報告. SDM, シリコン材料・デバイス","bibliographic_titleLang":"ja"}]}]},"item_10_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"熱酸化により形成したGeO_2/Ge(100)界面および金属(Al,AuおよびPt)薄膜形成後のGeO_2との界面化学結合状態をXPS分析により評価した。室温のAl蒸着において、GeO_2初期膜厚(>〜1nm)に関わらず、厚さ〜1nm程度GeO_2が還元されることが明らかになった。初期GeO_2膜厚が1.0nm程度の場合にはGeO_2からAlへの酸素原子の拡散が支配的であり、GeO_2膜厚が1.9nm以上の場合は酸素原子拡散に加えてAl-Ge結合の形成が明瞭に観測された。また、極薄AuおよびPtを熱酸化GeO_2上に堆積した場合、金属/GeO_2界面に熱酸化GeO_2/Ge界面と同等量のサブオキサイド成分(GeO_x:0