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Effect of in situ Sb doping on crystalline and electrical characteristics of n-type Ge1− x Sn x epitaxial layer
http://hdl.handle.net/2237/25280
http://hdl.handle.net/2237/25280c1f9524c-7598-4add-841d-af121b8fed14
名前 / ファイル | ライセンス | アクション |
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2016-12-21 | |||||
タイトル | ||||||
タイトル | Effect of in situ Sb doping on crystalline and electrical characteristics of n-type Ge1− x Sn x epitaxial layer | |||||
言語 | en | |||||
著者 |
Jeon, Jihee
× Jeon, Jihee× Asano, Takanori× Shimura, Yosuke× Takeuchi, Wakana× Kurosawa, Masashi× Sakashita, Mitsuo× Nakatsuka, Osamu× Zaima, Shigeaki |
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アクセス権 | ||||||
アクセス権 | open access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||
権利 | ||||||
言語 | en | |||||
権利情報 | © 2016 The Japan Society of Applied Physics | |||||
抄録 | ||||||
内容記述 | We examined the molecular beam epitaxy of Ge1− x Sn x with in situ Sb doping on Ge substrates. The effects of Sb doping on the crystalline and electrical characteristics of Ge1− x Sn x epitaxial layer were investigated in detail. We found that Sb doping with a concentration of 1020 cm−3 remarkably improves the crystallinity, and surface uniformity of the Ge1− x Sn x epitaxial layer by changing the growth mode by the surfactant effect of Sb atoms. Low-temperature Ge1− x Sn x growth with in situ Sb doping realizes a very high electron concentration of 1020 cm−3, which is above the thermal equilibrium solid solubility, as a result of suppressing Sb segregation and precipitation. | |||||
言語 | en | |||||
内容記述タイプ | Abstract | |||||
出版者 | ||||||
言語 | en | |||||
出版者 | IOP publishing | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプresource | http://purl.org/coar/resource_type/c_6501 | |||||
タイプ | journal article | |||||
出版タイプ | ||||||
出版タイプ | AM | |||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||
DOI | ||||||
関連タイプ | isVersionOf | |||||
識別子タイプ | DOI | |||||
関連識別子 | https://doi.org/10.7567/JJAP.55.04EB13 | |||||
ISSN | ||||||
収録物識別子タイプ | PISSN | |||||
収録物識別子 | 0021-4922 | |||||
書誌情報 |
en : Japanese Journal of Applied Physics 巻 55, 号 4S, p. 04EB13-04EB13, 発行日 2016-04 |
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著者版フラグ | ||||||
値 | author | |||||
URI | ||||||
識別子 | http://dx.doi.org/10.7567/JJAP.55.04EB13 | |||||
識別子タイプ | DOI | |||||
URI | ||||||
識別子 | http://hdl.handle.net/2237/25280 | |||||
識別子タイプ | HDL |