@article{oai:nagoya.repo.nii.ac.jp:00024117,
 author = {Hayashi, Toshio and Ishikawa, Kenji and Sekine, Makoto and Hori, Masaru},
 issue = {7S2},
 journal = {Japanese Journal of Applied Physics},
 month = {Jul},
 note = {The primary dissociation channels of SiH4 were investigated using computational chemistry. The results showed properties very similar to those of CH4. The main dissociation product was SiH2 and the second dissociation product was SiH3. SiH was produced through SiH3 to SiH + H2 dissociation by electronic excitation. H abstraction reactions by H and SiH3 were also calculated for SiH4, Si2H6, Si3H8, and Si9H14(100) cluster models. The energy barriers of H abstraction reactions were lower than those of SiH3 abstraction reactions. This result is considerably important for deposition in SiH4/H2 process plasma.},
 pages = {07LD07--07LD07},
 title = {Computational study on SiH4 dissociation channels and H abstraction reactions},
 volume = {55},
 year = {2016}
}