{"created":"2021-03-01T06:36:39.749099+00:00","id":28562,"links":{},"metadata":{"_buckets":{"deposit":"523e7024-5e6f-4fb2-9a6d-8961fd48c1ed"},"_deposit":{"id":"28562","owners":[],"pid":{"revision_id":0,"type":"depid","value":"28562"},"status":"published"},"_oai":{"id":"oai:nagoya.repo.nii.ac.jp:00028562","sets":["320:606:607"]},"author_link":["93636"],"item_12_alternative_title_19":{"attribute_name":"その他のタイトル","attribute_value_mlt":[{"subitem_alternative_title":"Study on Performance Enhancement of GaN Power Devices and the Low Temperature Plasma Process Technologies","subitem_alternative_title_language":"en"}]},"item_12_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2019-09-27","bibliographicIssueDateType":"Issued"}}]},"item_12_date_granted_64":{"attribute_name":"学位授与年月日","attribute_value_mlt":[{"subitem_dategranted":"2019-09-27"}]},"item_12_degree_grantor_62":{"attribute_name":"学位授与機関","attribute_value_mlt":[{"subitem_degreegrantor":[{"subitem_degreegrantor_language":"ja","subitem_degreegrantor_name":"名古屋大学"},{"subitem_degreegrantor_language":"en","subitem_degreegrantor_name":"Nagoya University"}],"subitem_degreegrantor_identifier":[{"subitem_degreegrantor_identifier_name":"13901","subitem_degreegrantor_identifier_scheme":"kakenhi"}]}]},"item_12_degree_name_61":{"attribute_name":"学位名","attribute_value_mlt":[{"subitem_degreename":"博士(工学)","subitem_degreename_language":"ja"}]},"item_12_dissertation_number_65":{"attribute_name":"学位授与番号","attribute_value_mlt":[{"subitem_dissertationnumber":"甲第12870号"}]},"item_12_select_15":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_select_item":"none"}]},"item_12_text_63":{"attribute_name":"学位授与年度","attribute_value_mlt":[{"subitem_text_value":"2019"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"磯部, 康裕","creatorNameLang":"ja"}],"nameIdentifiers":[{"nameIdentifier":"93636","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2019-10-31"}],"displaytype":"detail","filename":"k12870_abstract.pdf","filesize":[{"value":"241.1 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"k12870_abstract","objectType":"abstract","url":"https://nagoya.repo.nii.ac.jp/record/28562/files/k12870_abstract.pdf"},"version_id":"b836c625-19d6-4bf2-81d8-ad116773fd75"},{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2019-10-31"}],"displaytype":"detail","filename":"k12870_review.pdf","filesize":[{"value":"124.2 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"k12870_review","objectType":"other","url":"https://nagoya.repo.nii.ac.jp/record/28562/files/k12870_review.pdf"},"version_id":"bd6d6d32-e8fc-4051-afb7-f704b4292cf3"},{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2019-10-31"}],"displaytype":"detail","filename":"K12870_summary.pdf","filesize":[{"value":"386.3 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"K12870_summary","objectType":"summary","url":"https://nagoya.repo.nii.ac.jp/record/28562/files/K12870_summary.pdf"},"version_id":"4cfbdbd2-23ba-4b87-ab19-36d131863979"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"doctoral thesis","resourceuri":"http://purl.org/coar/resource_type/c_db06"}]},"item_title":"窒化物半導体パワーデバイスの高性能化とプラズマによる低温成膜技術に関する研究","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"窒化物半導体パワーデバイスの高性能化とプラズマによる低温成膜技術に関する研究","subitem_title_language":"ja"}]},"item_type_id":"12","owner":"1","path":["607"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2019-10-04"},"publish_date":"2019-10-04","publish_status":"0","recid":"28562","relation_version_is_last":true,"title":["窒化物半導体パワーデバイスの高性能化とプラズマによる低温成膜技術に関する研究"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-01-16T04:21:29.760858+00:00"}