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Studies on precisely controlled isotropic etching and its application to semiconductor device fabrication
http://hdl.handle.net/2237/00030768
http://hdl.handle.net/2237/00030768e0868bbb-9786-48ce-91e8-23378a475af9
名前 / ファイル | ライセンス | アクション |
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Item type | 学位論文 / Thesis or Dissertation(1) | |||||
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公開日 | 2019-10-04 | |||||
タイトル | ||||||
タイトル | Studies on precisely controlled isotropic etching and its application to semiconductor device fabrication | |||||
言語 | en | |||||
その他のタイトル | ||||||
その他のタイトル | 高精度等方性エッチングとその半導体デバイス製造への応用に関する研究 | |||||
言語 | ja | |||||
著者 |
SHINODA, Kazunori
× SHINODA, Kazunori× 篠田, 和典 |
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アクセス権 | ||||||
アクセス権 | metadata only access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_14cb | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源 | http://purl.org/coar/resource_type/c_db06 | |||||
タイプ | doctoral thesis | |||||
書誌情報 |
発行日 2019-09-27 |
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学位名 | ||||||
言語 | ja | |||||
学位名 | 博士(工学) | |||||
学位授与機関 | ||||||
学位授与機関識別子Scheme | kakenhi | |||||
学位授与機関識別子 | 13901 | |||||
言語 | ja | |||||
学位授与機関名 | 名古屋大学 | |||||
言語 | en | |||||
学位授与機関名 | Nagoya University | |||||
学位授与年度 | ||||||
学位授与年度 | 2019 | |||||
学位授与年月日 | ||||||
学位授与年月日 | 2019-09-27 | |||||
学位授与番号 | ||||||
学位授与番号 | 甲第12885号 | |||||
著者版フラグ | ||||||
値 | none |