{"created":"2021-03-01T06:37:09.934798+00:00","id":29021,"links":{},"metadata":{"_buckets":{"deposit":"ebbfa5fc-94af-464e-bf5f-02386640ae4c"},"_deposit":{"id":"29021","owners":[],"pid":{"revision_id":0,"type":"depid","value":"29021"},"status":"published"},"_oai":{"id":"oai:nagoya.repo.nii.ac.jp:00029021","sets":["320:321:322"]},"author_link":["95313","95314","95315","95316"],"item_10_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2019-11","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"22","bibliographicPageStart":"1900495","bibliographicVolumeNumber":"216","bibliographic_titles":[{"bibliographic_title":"physica status solidi (a)","bibliographic_titleLang":"en"}]}]},"item_10_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Carrier‐selective contacts prepared by atomic layer deposition (ALD) have received significant attention for developing high‐efficiency solar cells. Herein, the electrical properties of titanium oxide (TiOx) prepared by ALD are manipulated by modulating the deposition temperature during ALD. Tunable electrical properties are possible due to the existence of oxygen vacancies in TiOx prepared at low deposition temperatures. TiOx layers prepared at 100 and 150 °C provide a low contact resistivity and high passivation performance, respectively. A high carrier selectivity of 13.5 is achieved by stacking the TiOx layers prepared at 100 and 150 °C, compared with a single TiOx layer. Modulating the deposition temperature can, therefore, improve the electrical properties of ALD‐TiOx. This approach can be used to optimize the functionality of ALD‐based materials.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_10_description_5":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"ファイル公開：2020-11-01","subitem_description_language":"ja","subitem_description_type":"Other"}]},"item_10_publisher_32":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"Wiley","subitem_publisher_language":"en"}]},"item_10_relation_11":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type":"isVersionOf","subitem_relation_type_id":{"subitem_relation_type_id_text":"https://doi.org/10.1002/pssa.201900495","subitem_relation_type_select":"DOI"}}]},"item_10_rights_12":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"This is the peer reviewed version of the following article: [Gotoh, K., Mochizuki, T., Kurokawa, Y. and Usami, N. (2019), Tuning the Electrical Properties of Titanium Oxide Bilayers Prepared by Atomic Layer Deposition at Different Temperatures. Phys. Status Solidi A, 216: 1900495. doi:10.1002/pssa.201900495], which has been published in final form at [https://doi.org/10.1002/pssa.201900495]. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Use of Self-Archived Versions.","subitem_rights_language":"en"}]},"item_10_select_15":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_select_item":"author"}]},"item_10_source_id_61":{"attribute_name":"ISSN（print）","attribute_value_mlt":[{"subitem_source_identifier":"1862-6300","subitem_source_identifier_type":"PISSN"}]},"item_1615787544753":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_abf2"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Gotoh, Kazuhiro","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"95313","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Mochizuki, Takeya","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"95314","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Kurokawa, Yasuyoshi","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"95315","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Usami, Noritaka","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"95316","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2020-11-01"}],"displaytype":"detail","filename":"PSSA_Stack_final.pdf","filesize":[{"value":"1.0 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"PSSA_Stack_final","objectType":"fulltext","url":"https://nagoya.repo.nii.ac.jp/record/29021/files/PSSA_Stack_final.pdf"},"version_id":"d93bc73d-ed6e-42a1-95b3-6d0c69c73454"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"atomic layer deposition","subitem_subject_scheme":"Other"},{"subitem_subject":"crystalline silicon","subitem_subject_scheme":"Other"},{"subitem_subject":"passivation","subitem_subject_scheme":"Other"},{"subitem_subject":"titanium oxide","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Tuning the Electrical Properties of Titanium Oxide Bilayers Prepared by Atomic Layer Deposition at Different Temperatures","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Tuning the Electrical Properties of Titanium Oxide Bilayers Prepared by Atomic Layer Deposition at Different Temperatures","subitem_title_language":"en"}]},"item_type_id":"10","owner":"1","path":["322"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2020-01-17"},"publish_date":"2020-01-17","publish_status":"0","recid":"29021","relation_version_is_last":true,"title":["Tuning the Electrical Properties of Titanium Oxide Bilayers Prepared by Atomic Layer Deposition at Different Temperatures"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-01-16T04:59:12.021947+00:00"}