{"created":"2021-03-01T06:37:55.241959+00:00","id":29699,"links":{},"metadata":{"_buckets":{"deposit":"40db12ac-7b57-4d85-a564-de3c3a79366f"},"_deposit":{"id":"29699","owners":[],"pid":{"revision_id":0,"type":"depid","value":"29699"},"status":"published"},"_oai":{"id":"oai:nagoya.repo.nii.ac.jp:00029699","sets":["320:606:607"]},"author_link":["97299","100477"],"item_12_alternative_title_19":{"attribute_name":"その他のタイトル","attribute_value_mlt":[{"subitem_alternative_title":"GaNの新しいプラズマ成膜及びエッチングに関する研究","subitem_alternative_title_language":"ja"}]},"item_12_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2020-03-25","bibliographicIssueDateType":"Issued"}}]},"item_12_date_granted_64":{"attribute_name":"学位授与年月日","attribute_value_mlt":[{"subitem_dategranted":"2020-03-25"}]},"item_12_degree_grantor_62":{"attribute_name":"学位授与機関","attribute_value_mlt":[{"subitem_degreegrantor":[{"subitem_degreegrantor_language":"ja","subitem_degreegrantor_name":"名古屋大学"},{"subitem_degreegrantor_language":"en","subitem_degreegrantor_name":"Nagoya University"}],"subitem_degreegrantor_identifier":[{"subitem_degreegrantor_identifier_name":"13901","subitem_degreegrantor_identifier_scheme":"kakenhi"}]}]},"item_12_degree_name_61":{"attribute_name":"学位名","attribute_value_mlt":[{"subitem_degreename":"博士(工学)","subitem_degreename_language":"ja"}]},"item_12_dissertation_number_65":{"attribute_name":"学位授与番号","attribute_value_mlt":[{"subitem_dissertationnumber":"甲第13136号"}]},"item_12_select_15":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_select_item":"none"}]},"item_12_text_63":{"attribute_name":"学位授与年度","attribute_value_mlt":[{"subitem_text_value":"2019"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"metadata only access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_14cb"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"TANIDE, Atsushi","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"97299","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"谷出, 敦","creatorNameLang":"ja"}],"nameIdentifiers":[{"nameIdentifier":"100477","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2020-06-30"}],"displaytype":"detail","filename":"k13136_abstract.pdf","filesize":[{"value":"266.7 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"k13136_abstract","objectType":"abstract","url":"https://nagoya.repo.nii.ac.jp/record/29699/files/k13136_abstract.pdf"},"version_id":"ec8fe959-fc9b-42b5-99f2-160b560f6a52"},{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2020-06-30"}],"displaytype":"detail","filename":"k13136_review.pdf","filesize":[{"value":"100.4 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"k13136_review","objectType":"other","url":"https://nagoya.repo.nii.ac.jp/record/29699/files/k13136_review.pdf"},"version_id":"d4af5289-df0f-4172-a0ab-64225d076d84"},{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2020-06-30"}],"displaytype":"detail","filename":"k13136_summary.pdf","filesize":[{"value":"337.4 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"k13136_summary","objectType":"summary","url":"https://nagoya.repo.nii.ac.jp/record/29699/files/k13136_summary.pdf"},"version_id":"f5ed8d97-1be3-4cce-b519-8c37aa7b5c44"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"doctoral thesis","resourceuri":"http://purl.org/coar/resource_type/c_db06"}]},"item_title":"Study on new plasma processes for growth and etching of GaN thin films","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Study on new plasma processes for growth and etching of GaN thin films","subitem_title_language":"en"}]},"item_type_id":"12","owner":"1","path":["607"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2020-04-02"},"publish_date":"2020-04-02","publish_status":"0","recid":"29699","relation_version_is_last":true,"title":["Study on new plasma processes for growth and etching of GaN thin films"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-01-16T04:22:27.523027+00:00"}