@article{oai:nagoya.repo.nii.ac.jp:00005112,
 author = {Masuda, Yoshitake and Seo, Won-Seon and Koumoto, Kunihito and 増田, 佳丈 and 河本, 邦仁},
 issue = {1-2},
 journal = {Thin Solid Films},
 month = {Feb},
 note = {Novel processes to arrange fine silica spheres two-dimensionally on self-assembled monolayers (SAM) were developed. SiO2 sphere surfaces were modified to have CN groups by the use of trichlorocyanoethylsilane, and CN groups were oxidized to COOH groups with t-BuOK. A SAM of PTCS (phenyltrichlorosilane) was modified to have a phenyl / silanol-group pattern by UV(Ultra Violet) irradiation using a photomask and was used as a template to arrange fine SiO2 spheres. SiO2 spheres were selectively attached to silanol surfaces possibly forming ester bonds, which enabled the fabrication of micropatterned arrangements of SiO2 spheres},
 pages = {183--189},
 title = {Two-dimensional arrangement of fine silica spheres on self-assembled monolayers},
 volume = {382},
 year = {2001}
}