{"created":"2021-03-01T06:11:39.362200+00:00","id":5112,"links":{},"metadata":{"_buckets":{"deposit":"a055cb4a-4b5c-45f1-a720-d506c63021da"},"_deposit":{"id":"5112","owners":[],"pid":{"revision_id":0,"type":"depid","value":"5112"},"status":"published"},"_oai":{"id":"oai:nagoya.repo.nii.ac.jp:00005112","sets":["320:321:322"]},"author_link":["12656","12657","12658","12659","12660"],"item_10_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2001-02-01","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"1-2","bibliographicPageEnd":"189","bibliographicPageStart":"183","bibliographicVolumeNumber":"382","bibliographic_titles":[{"bibliographic_title":"Thin Solid Films","bibliographic_titleLang":"en"}]}]},"item_10_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Novel processes to arrange fine silica spheres two-dimensionally on self-assembled monolayers (SAM) were developed. SiO2 sphere surfaces were modified to have CN groups by the use of trichlorocyanoethylsilane, and CN groups were oxidized to COOH groups with t-BuOK. A SAM of PTCS (phenyltrichlorosilane) was modified to have a phenyl / silanol-group pattern by UV(Ultra Violet) irradiation using a photomask and was used as a template to arrange fine SiO2 spheres. SiO2 spheres were selectively attached to silanol surfaces possibly forming ester bonds, which enabled the fabrication of micropatterned arrangements of SiO2 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