{"created":"2021-03-01T06:11:50.816379+00:00","id":5291,"links":{},"metadata":{"_buckets":{"deposit":"a8040599-5309-49da-85d6-04a3af6d3c92"},"_deposit":{"id":"5291","owners":[],"pid":{"revision_id":0,"type":"depid","value":"5291"},"status":"published"},"_oai":{"id":"oai:nagoya.repo.nii.ac.jp:00005291","sets":["320:321:322"]},"author_link":["13413","13414","13415","13416","13417"],"item_10_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"1997-08","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"4","bibliographicPageEnd":"455","bibliographicPageStart":"450","bibliographicVolumeNumber":"4","bibliographic_titles":[{"bibliographic_title":"IEEE Transactions on Dielectrics and Electrical Insulation [see also IEEE Transactions on Electrical Insulation]","bibliographic_titleLang":"en"}]}]},"item_10_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"We measured dc dischage inception voltage V_i for various electrode configurarions in He, Ar and air in vacuum range from 10^5 to 10^-1 Pa to determine discharge characteristics under space vacuum environment. By quantitative consideration of the Ei/p distribution in the gap space at the discharge inception, the discharge inception mechanism under nonuniform electric field was investigated in vacuum. At the same time, we observed the diacharge profile variation with residual gas pressure and quantitatively analyzed its characteristics, using an image processing technique. Based on the analysis, we found that the dependency of the discharge inception voltage and the length of the discharge path on the residual gas pressure under non-uniform field conditions agreed well with the dependency prreviously obtained for uniform field donditions>","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_10_identifier_60":{"attribute_name":"URI","attribute_value_mlt":[{"subitem_identifier_type":"HDL","subitem_identifier_uri":"http://hdl.handle.net/2237/6878"}]},"item_10_publisher_32":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"IEEE","subitem_publisher_language":"en"}]},"item_10_relation_11":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type":"isVersionOf","subitem_relation_type_id":{"subitem_relation_type_id_text":"https://doi.org/10.1109/94.625362","subitem_relation_type_select":"DOI"}}]},"item_10_rights_12":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"Copyright © 1997 IEEE. Reprinted from (relevant publication info). This material is posted here with permission of the IEEE. Such permission of the IEEE does not in any way imply IEEE endorsement of any of Nagoya University’s products or services. Internal or personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution must be obtained from the IEEE by writing to pubs-permissions@ieee.org.","subitem_rights_language":"en"}]},"item_10_select_15":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_select_item":"publisher"}]},"item_10_text_14":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_text_value":"application/pdf"}]},"item_1615787544753":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_abf2"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Okubo, H.","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"13413","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Yuasa, S.","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"13414","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Ota, K.","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"13415","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Hayakawa, N.","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"13416","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Hikita, M.","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"13417","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2018-02-19"}],"displaytype":"detail","filename":"di_el_ins_4_4_450.pdf","filesize":[{"value":"2.7 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"di_el_ins_4_4_450.pdf","objectType":"fulltext","url":"https://nagoya.repo.nii.ac.jp/record/5291/files/di_el_ins_4_4_450.pdf"},"version_id":"83459c81-fb20-4b19-8b2e-7e8ac308fe76"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Discharge characteristics under non-uniform electric field in He, Ar and air at low pressures","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Discharge characteristics under non-uniform electric field in He, Ar and air at low pressures","subitem_title_language":"en"}]},"item_type_id":"10","owner":"1","path":["322"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2006-08-31"},"publish_date":"2006-08-31","publish_status":"0","recid":"5291","relation_version_is_last":true,"title":["Discharge characteristics under non-uniform electric field in He, Ar and air at low pressures"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-01-16T03:49:55.568394+00:00"}