@article{oai:nagoya.repo.nii.ac.jp:00005423,
 author = {Miyata, Koji and Arai, Hiroyoshi and Hori, Masaru and Goto, Toshio},
 issue = {10},
 journal = {Journal of Applied Physics},
 month = {Nov},
 note = {The absolute density of the cyanogen fluoride (FCN) molecule has been measured in a CHF_3 /N_2 electron-cyclotron-resonance (ECR) plasma using infrared diode laser absorption spectroscopy. The R(22) rotational-vibrational line at 1060.340 cm^-1 in the ν_1 fundamental of ^19F^12C^14N was used for the spectroscopy. The extinction process of FCN in the afterglow was discussed on the basis of the decay rate after discharge termination. Moreover, the absolute FCN density in a CHF_3 ECR plasma during etching of silicon nitride has been calculated on the basis of the data shown in our previous study [K. Miyata et al., J. Vac. Sci. Technol. A 15, 568 (1997)]. It was found that approximately 10% of nitrogen atoms coming from silicon nitride formed FCN.},
 pages = {4777--4780},
 title = {Absolute density measurement of cyanogen fluoride in CHF_3/N_2 electron cyclotron resonance plasma using infrared diode laser absorption spectroscopy},
 volume = {82},
 year = {1997}
}