@article{oai:nagoya.repo.nii.ac.jp:00005425,
 author = {Sasaki, K. and Kawai, Y. and Suzuki, C. and Kadota, K.},
 issue = {12},
 journal = {Journal of Applied Physics},
 month = {Jun},
 note = {Absolute density and reaction kinetics of fluorine (F) atoms in high-density octafluorocyclobutane (c-C_4F_8) plasmas were examined using vacuum ultraviolet absorption spectroscopy. The F atom densities, corresponding to electron densities ranging from 1*10^11 to 5*10^12 cm^-3, were 1 *10^12-5*10^13 cm^-3 for gas pressures of 2-7 mTorr and rf powers of 0.2-1.5 kW. The F atom density was linearly dependent on the electron density for n_e<1.5*10^12 cm^-3. According to lifetime measurements in the afterglow, two decay processes were found in the F atom density: exponential (first-order kinetics) and linear (zero-order kinetics) decay components. The linear-decay component became significant at high gas pressures. The time constant of the exponential-decay component ranged from 5 to 100 ms, which corresponds to surface loss probabilities of 10^-1-10^-3. The surface loss probability varied inversely with the F atom density.},
 pages = {7482--7487},
 title = {Absolute density and reaction kinetics of fluorine atoms in high-density c-C_4F_8 plasmas},
 volume = {83},
 year = {1998}
}