@article{oai:nagoya.repo.nii.ac.jp:00005427,
 author = {Sasaki, K. and Kawai, Y. and Suzuki, C. and Kadota, K.},
 issue = {12},
 journal = {Journal of Applied Physics},
 month = {Dec},
 note = {Reaction processes of fluorine (F) atoms in high-density carbon–tetrafluoride (CF_4) plasmas were investigated using vacuum ultraviolet absorption spectroscopy. A scaling law n_F^∝(n_en_{CF_4})^{0.5– 0.7} was found experimentally, where n_F is the F atom density and n_e and n_{CF_4} stand for the electron and parent gas (CF_4) densities, respectively. The lifetime measurement in the afterglow showed that the decay curve of the F atom density was composed of two components: a rapid decay in the initial afterglow and an exponential decrease in the late afterglow. The decay time constant in the initial afterglow τ_1 satisfied the scaling law τ_1^∝(n_en_{CF_4})^{-(0.3– 0.4)}, which is a consistent relationship with the scaling law for the F atom density. The two scaling laws and the lifetimes of CFx radicals suggest that the major loss process of F atoms in the initial afterglow is the reaction with CF_x radicals (probably, x=3) on the wall surface. The loss process in the late afterglow was simple diffusion to the wall surface. The surface loss probability of F atoms on the chamber wall was evaluated from the decay time constant in the late afterglow, and was on the order of 10^-3.},
 pages = {5938--5943},
 title = {Kinetics of fluorine atoms in high-density carbon–tetrafluoride plasmas},
 volume = {82},
 year = {1997}
}