{"created":"2021-03-01T06:12:12.875621+00:00","id":5644,"links":{},"metadata":{"_buckets":{"deposit":"536645f8-361e-4a34-9814-136b4d0d4005"},"_deposit":{"id":"5644","owners":[],"pid":{"revision_id":0,"type":"depid","value":"5644"},"status":"published"},"_oai":{"id":"oai:nagoya.repo.nii.ac.jp:00005644","sets":["320:321:322"]},"author_link":["14921","14922","14923"],"item_10_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2002-04-29","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"17","bibliographicPageEnd":"3068","bibliographicPageStart":"3066","bibliographicVolumeNumber":"80","bibliographic_titles":[{"bibliographic_title":"Applied Physics Letters","bibliographic_titleLang":"en"}]}]},"item_10_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"A thermal probe for plasma diagnostics is introduced. The method is based upon measuring the equilibrium temperature of a conducting sphere as a function of its applied bias. The resulting temperature–voltage characteristic is processed using a theoretical model that accounts for charge and thermodynamic balance. The thermal probe is capable of detecting negative ions and shows sensitivity to certain chemical reactions. Measurements performed in Ar, Ar/SF_6, and O_2 show good agreement among the plasma parameters using thermal and Langmuir probes.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_10_identifier_60":{"attribute_name":"URI","attribute_value_mlt":[{"subitem_identifier_type":"HDL","subitem_identifier_uri":"http://hdl.handle.net/2237/7250"}]},"item_10_publisher_32":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"American Institute of Physics","subitem_publisher_language":"en"}]},"item_10_relation_11":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type":"isVersionOf","subitem_relation_type_id":{"subitem_relation_type_id_text":"https://doi.org/10.1063/1.1473688","subitem_relation_type_select":"DOI"}}]},"item_10_rights_12":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"Copyright (2002) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.","subitem_rights_language":"en"}]},"item_10_select_15":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_select_item":"publisher"}]},"item_10_source_id_7":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"0003-6951","subitem_source_identifier_type":"PISSN"}]},"item_10_text_14":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_text_value":"application/pdf"}]},"item_1615787544753":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_abf2"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Stamate, E.","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"14921","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Sugai, H.","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"14922","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Ohe, K.","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"14923","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2018-02-19"}],"displaytype":"detail","filename":"ApplPhysLett_80_3066.pdf","filesize":[{"value":"171.6 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"ApplPhysLett_80_3066.pdf","objectType":"fulltext","url":"https://nagoya.repo.nii.ac.jp/record/5644/files/ApplPhysLett_80_3066.pdf"},"version_id":"e4d993cc-3c24-4730-a6aa-3d2bceebfc2c"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Principle and application of a thermal probe to reactive plasmas","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Principle and application of a thermal probe to reactive plasmas","subitem_title_language":"en"}]},"item_type_id":"10","owner":"1","path":["322"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2007-01-15"},"publish_date":"2007-01-15","publish_status":"0","recid":"5644","relation_version_is_last":true,"title":["Principle and application of a thermal probe to reactive plasmas"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-01-16T03:50:22.295465+00:00"}