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AlGaN/GaN HEMTs With Thin InGaN Cap Layer for Normally Off Operation
http://hdl.handle.net/2237/9477
http://hdl.handle.net/2237/94778dd84650-0971-4a75-acff-9f145450a517
名前 / ファイル | ライセンス | アクション |
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2008-02-26 | |||||
タイトル | ||||||
タイトル | AlGaN/GaN HEMTs With Thin InGaN Cap Layer for Normally Off Operation | |||||
言語 | en | |||||
著者 |
Mizutani, T.
× Mizutani, T.× Ito, M.× Kishimoto, S.× Nakamura, F. |
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アクセス権 | ||||||
アクセス権 | open access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||
権利 | ||||||
言語 | en | |||||
権利情報 | Copyright © 2007 IEEE. Reprinted from (relevant publication info). This material is posted here with permission of the IEEE. Such permission of the IEEE does not in any way imply IEEE endorsement of any of Nagoya University’s products or services. Internal or personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution must be obtained from the IEEE by writing to pubs-permissions@ieee.org. | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | AlGaN/GaN | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | HEMT | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | InGaN cap | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | normally off | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | polarization-induced field | |||||
抄録 | ||||||
内容記述 | AlGaN/GaN HEMTs with a thin InGaN cap layer have been proposed to implement the normally off HEMTs. The key idea is to employ the polarization-induced field in the InGaN cap layer, by which the conduction band is raised, which leads to the normally off operation. The fabricated HEMT with an In0.2Ga0.8N cap layer with a thickness of 5 nm showed normally off operation with a threshold voltage of 0.4 V and a maximum transconductance of 85 mS/mm for the device with a 1.9-μm-long gate. By etching off the In0.2Ga0.8N cap layer at the access region using gate electrode as an etching mask, the maximum transconductance has increased from 85 to 130 mS/mm due to a reduction of the parasitic source resistance. | |||||
言語 | en | |||||
内容記述タイプ | Abstract | |||||
出版者 | ||||||
言語 | en | |||||
出版者 | IEEE | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプresource | http://purl.org/coar/resource_type/c_6501 | |||||
タイプ | journal article | |||||
出版タイプ | ||||||
出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
DOI | ||||||
関連タイプ | isVersionOf | |||||
識別子タイプ | DOI | |||||
関連識別子 | https://doi.org/10.1109/LED.2007.900202 | |||||
ISSN | ||||||
収録物識別子タイプ | PISSN | |||||
収録物識別子 | 0741-3106 | |||||
書誌情報 |
en : IEEE Electron Device Letters 巻 28, 号 7, p. 549-551, 発行日 2007 |
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フォーマット | ||||||
application/pdf | ||||||
著者版フラグ | ||||||
値 | publisher | |||||
URI | ||||||
識別子 | http://hdl.handle.net/2237/9477 | |||||
識別子タイプ | HDL |