{"created":"2021-03-01T06:16:08.940678+00:00","id":9384,"links":{},"metadata":{"_buckets":{"deposit":"28a0bbce-e534-458d-b657-bdb444d5f317"},"_deposit":{"id":"9384","owners":[],"pid":{"revision_id":0,"type":"depid","value":"9384"},"status":"published"},"_oai":{"id":"oai:nagoya.repo.nii.ac.jp:00009384","sets":["320:321:322"]},"author_link":["26845","26846","26847","26848"],"item_10_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2008-04","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"2","bibliographicPageEnd":"431","bibliographicPageStart":"410","bibliographicVolumeNumber":"17","bibliographic_titles":[{"bibliographic_title":"Journal of Microelectromechanical Systems","bibliographic_titleLang":"en"}]}]},"item_10_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"The fabrication of micro- and nanoelectromechanical systems (MEMS/NEMS) is based on a wide variety of growth and etching technologies sequentially applied throughout process flows which may involve a dozen or more steps, their realistic simulation having become an essential part of the overall design. By focusing in the simulation of anisotropic etching as a complex example of microfabrication, in this paper, we show how to solve analytically the time evolution of the continuous cellular automaton method, thus providing a particularly suitable choice for the realization of realistic simulations for MEMS and NEMS applications. This paper presents a complete theoretical derivation of the analytical solution based on geometrical and kinetic aspects of step flow on any surface, including a new classification of the surface sites based on a mean-field treatment of the propagation of the steps. The results of the corresponding simulations are in good agreement with the experiments. The study can be seen as an example of a general procedure that is applicable to other interface propagation problems.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_10_identifier_60":{"attribute_name":"URI","attribute_value_mlt":[{"subitem_identifier_type":"HDL","subitem_identifier_uri":"http://hdl.handle.net/2237/11160"}]},"item_10_publisher_32":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"IEEE","subitem_publisher_language":"en"}]},"item_10_relation_11":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type":"isVersionOf","subitem_relation_type_id":{"subitem_relation_type_id_text":"https://doi.org/10.1109/JMEMS.2008.916339","subitem_relation_type_select":"DOI"}}]},"item_10_rights_12":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"Copyright © 2008 IEEE. Reprinted from Journal of Microelectromechanical Systems. v.17, n.2, 2008, p.410-431. This material is posted here with permission of the IEEE. Such permission of the IEEE does not in any way imply IEEE endorsement of any of Nagoya University’s products or services. Internal or personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution must be obtained from the IEEE by writing to pubs-permissions@ieee.org.","subitem_rights_language":"en"}]},"item_10_select_15":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_select_item":"publisher"}]},"item_10_source_id_7":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"1057-7157","subitem_source_identifier_type":"PISSN"}]},"item_10_text_14":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_text_value":"application/pdf"}]},"item_1615787544753":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_abf2"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Gosálvez, Miguel A.","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"26845","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Xing, Yan","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"26846","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Sato, Kazuo","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"26847","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"佐藤, 一雄","creatorNameLang":"ja"}],"nameIdentifiers":[{"nameIdentifier":"26848","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2018-02-20"}],"displaytype":"detail","filename":"getPDF_jsp.pdf","filesize":[{"value":"2.7 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"getPDF_jsp.pdf","objectType":"fulltext","url":"https://nagoya.repo.nii.ac.jp/record/9384/files/getPDF_jsp.pdf"},"version_id":"3b9b32ad-9623-459c-a2ff-ee0daaa2ad6d"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Anisotropic etching","subitem_subject_scheme":"Other"},{"subitem_subject":"cellular automata (CA)","subitem_subject_scheme":"Other"},{"subitem_subject":"simulation","subitem_subject_scheme":"Other"},{"subitem_subject":"step flow","subitem_subject_scheme":"Other"},{"subitem_subject":"surface processing","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Analytical Solution of the Continuous Cellular Automaton for Anisotropic Etching","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Analytical Solution of the Continuous Cellular Automaton for Anisotropic Etching","subitem_title_language":"en"}]},"item_type_id":"10","owner":"1","path":["322"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2009-02-25"},"publish_date":"2009-02-25","publish_status":"0","recid":"9384","relation_version_is_last":true,"title":["Analytical Solution of the Continuous Cellular Automaton for Anisotropic Etching"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-01-16T03:54:59.699960+00:00"}