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Fluorination mechanisms of Al2O3 and Y2O3 surfaces irradiated by high-density CF4/O2 and SF6/O2 plasmas
http://hdl.handle.net/2237/12625
http://hdl.handle.net/2237/12625cd78c9a2-b226-4b5c-a237-ed4878e8bea8
名前 / ファイル | ライセンス | アクション |
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2010-01-20 | |||||
タイトル | ||||||
タイトル | Fluorination mechanisms of Al2O3 and Y2O3 surfaces irradiated by high-density CF4/O2 and SF6/O2 plasmas | |||||
言語 | en | |||||
著者 |
Miwa, Kazuhiro
× Miwa, Kazuhiro× Takada, Noriharu× Sasaki, Koichi |
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アクセス権 | ||||||
アクセス権 | open access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||
権利 | ||||||
言語 | en | |||||
権利情報 | Copyright (2009) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior per mission of the author and the American Institute of Physics. | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | alumina | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | bonds (chemical) | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | ion-surface impact | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | plasma materials | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | processing | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | surface chemistry | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | yttrium compounds | |||||
抄録 | ||||||
内容記述 | Fluorination of Al2O3 and Y2O3 surfaces was investigated by irradiating high-density, helicon-wave CF4 /O2 and SF6 /O2 plasmas. The Al2O3 surface bombarded by high-flux positive ions of the CF4 /O2 plasma was fluorinated significantly. On contrast, Y2O3 was less fluorinated than Al2O3 when they were irradiated by the same CF4 /O2 plasma. The analysis of the Al2O3 surface irradiated by the CF4 /O2 plasma suggests that the fluorination is triggered by reactions between fluorocarbon deposit and Al–O bonding with the assistance of ion bombardment. On the other hand, irradiation of the SF6 /O2 plasma induced less significant fluorination on the Al2O3 surface. This suggests a lower reaction probability between sulfur fluoride deposit and Al–O bonding. The difference in the fluorination of the Al2O3 and Y2O3 surfaces induced by the irradiations of the CF4 /O2 and SF6 /O2 plasmas is understood by comparing the bonding energies of C–O, S–O, Al–O, and Y–O. | |||||
言語 | en | |||||
内容記述タイプ | Abstract | |||||
出版者 | ||||||
言語 | en | |||||
出版者 | American Institite of Physics | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプresource | http://purl.org/coar/resource_type/c_6501 | |||||
タイプ | journal article | |||||
出版タイプ | ||||||
出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
DOI | ||||||
関連タイプ | isVersionOf | |||||
識別子タイプ | DOI | |||||
関連識別子 | https://doi.org/10.1116/1.3112624 | |||||
ISSN | ||||||
収録物識別子タイプ | PISSN | |||||
収録物識別子 | 0734-2101 | |||||
書誌情報 |
en : Journal of Vacuum Science and Technology A 巻 27, 号 4, p. 831-835, 発行日 2009-06-29 |
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フォーマット | ||||||
application/pdf | ||||||
著者版フラグ | ||||||
値 | publisher | |||||
URI | ||||||
識別子 | http://hdl.handle.net/2237/12625 | |||||
識別子タイプ | HDL | |||||
URI | ||||||
識別子 | http://dx.doi.org/10.1116/1.3112624 | |||||
識別子タイプ | DOI |