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  1. B200 工学部/工学研究科
  2. B200a 雑誌掲載論文
  3. 学術雑誌

Silicon microfluidic channels and microstructures in single photolithography step

http://hdl.handle.net/2237/13917
137cf7bb-2fb9-4736-b624-c826eebb69e5
名前 / ファイル ライセンス アクション
09_DTIP_Prem.pdf 09_DTIP_Prem.pdf (1.1 MB)
Item type 学術雑誌論文 / Journal Article(1)
公開日 2010-08-03
タイトル
タイトル Silicon microfluidic channels and microstructures in single photolithography step
著者 Pal, Prem

× Pal, Prem

WEKO 38184

Pal, Prem

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Sato, Kazuo

× Sato, Kazuo

WEKO 38185

Sato, Kazuo

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権利
権利情報 ©2009 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
抄録
内容記述 In this paper, a fabrication method of suspended silicon microfluidic channels and various shapes of microstructures of desired thickness in (100)-Si wafers using single photolithography step is presented. The fabrication method uses wafer bonding with silicon nitride (Si3N4) as intermediate layer, local oxidation of silicon (LOCOS), and complementary metal oxide semiconductor (CMOS) process compatible wet anisotropic etching. The etching process is performed in two steps in non-ionic surfactant Triton-X-100 [C14H22O(C2H4O)n] added and pure tetramethyl ammonium hydroxide (TMAH) solutions. The surfactant added TMAH is used to define the shape of the structures, whereas pure TMAH is employed for their release.
内容記述タイプ Abstract
出版者
出版者 IEEE
言語
言語 eng
資源タイプ
資源タイプresource http://purl.org/coar/resource_type/c_6501
タイプ journal article
ISBN
関連識別子
識別子タイプ ISBN
関連識別子 978-1-4244-3874-7
書誌情報 Symposium on Design, Test, Integration & Packaging of MEMS/MOEMS (MEMS/MOEMS '09)

p. 419-423, 発行日 2009-04-01
フォーマット
application/pdf
著者版フラグ
値 publisher
URI
識別子 http://hdl.handle.net/2237/13917
識別子タイプ HDL
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