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  1. B200 工学部/工学研究科
  2. B200a 雑誌掲載論文
  3. 学術雑誌

Auger electron emission from a Si(111) surface during 11-keV Ar+ ion sputtering

http://hdl.handle.net/2237/20778
http://hdl.handle.net/2237/20778
d9184950-f92b-4f95-bedb-d0d1d3132828
名前 / ファイル ライセンス アクション
ICACS25_paper_Kawai.pdf ICACS25_paper_Kawai.pdf (535.0 kB)
Item type 学術雑誌論文 / Journal Article(1)
公開日 2014-11-14
タイトル
タイトル Auger electron emission from a Si(111) surface during 11-keV Ar+ ion sputtering
言語 en
著者 Kawai, K.

× Kawai, K.

WEKO 54414

en Kawai, K.

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Sakuma, Y.

× Sakuma, Y.

WEKO 54415

en Sakuma, Y.

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Kato, M.

× Kato, M.

WEKO 54416

en Kato, M.

Search repository
Soda, K.

× Soda, K.

WEKO 54417

en Soda, K.

Search repository
アクセス権
アクセス権 open access
アクセス権URI http://purl.org/coar/access_right/c_abf2
権利
言語 en
権利情報 This is the author's version of a work that was accepted for publication in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms, may not be reflected in this document. Changes may have been made to this work since it was submitted for publication. A definitive version was subsequently published in Journal of Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. v.315, 2013, p.283–286, DOI:10.1016/j.nimb.2013.05.077.
抄録
内容記述 Ion sputtering experiments were carried out for a Si(1 1 1)-7 × 7 surface, irradiated with an 11-keV Ar+ beam. The energy spectra of secondary electrons were measured with a cylindrical mirror analyzer (CMA). The dependence of the Auger electron yield on the ion incidence angle, θ, measured from the surface normal, was studied by varying θ from 0° to 80°. The Auger electron yield increases with increasing incidence angle. This angular dependence is similar to that of the Si sputtering yield. Both angular dependences could be reasonably understood in terms of ion range, escape depths of the sputtered ion and the electron mean free path.
言語 en
内容記述タイプ Abstract
出版者
言語 en
出版者 Elsevier
言語
言語 eng
資源タイプ
資源タイプresource http://purl.org/coar/resource_type/c_6501
タイプ journal article
出版タイプ
出版タイプ AM
出版タイプResource http://purl.org/coar/version/c_ab4af688f83e57aa
DOI
関連タイプ isVersionOf
識別子タイプ DOI
関連識別子 https://doi.org/10.1016/j.nimb.2013.05.077
ISSN
収録物識別子タイプ PISSN
収録物識別子 0168-583X
書誌情報 en : Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

巻 315, p. 283-286, 発行日 2013-11
著者版フラグ
値 author
URI
識別子 http://dx.doi.org/10.1016/j.nimb.2013.05.077
識別子タイプ DOI
URI
識別子 http://hdl.handle.net/2237/20778
識別子タイプ HDL
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