{"_buckets": {"deposit": "2d910913-619c-4100-993e-e05abc58806a"}, "_deposit": {"id": "18683", "owners": [], "pid": {"revision_id": 0, "type": "depid", "value": "18683"}, "status": "published"}, "_oai": {"id": "oai:nagoya.repo.nii.ac.jp:00018683", "sets": ["322"]}, "author_link": ["54414", "54415", "54416", "54417"], "item_10_biblio_info_6": {"attribute_name": "書誌情報", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2013-11", "bibliographicIssueDateType": "Issued"}, "bibliographicPageEnd": "286", "bibliographicPageStart": "283", "bibliographicVolumeNumber": "315", "bibliographic_titles": [{"bibliographic_title": "Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms", "bibliographic_titleLang": "en"}]}]}, "item_10_description_4": {"attribute_name": "抄録", "attribute_value_mlt": [{"subitem_description": "Ion sputtering experiments were carried out for a Si(1 1 1)-7 × 7 surface, irradiated with an 11-keV Ar+ beam. The energy spectra of secondary electrons were measured with a cylindrical mirror analyzer (CMA). The dependence of the Auger electron yield on the ion incidence angle, θ, measured from the surface normal, was studied by varying θ from 0° to 80°. The Auger electron yield increases with increasing incidence angle. This angular dependence is similar to that of the Si sputtering yield. Both angular dependences could be reasonably understood in terms of ion range, escape depths of the sputtered ion and the electron mean free path.", "subitem_description_language": "en", "subitem_description_type": "Abstract"}]}, "item_10_identifier_60": {"attribute_name": "URI", "attribute_value_mlt": [{"subitem_identifier_type": "DOI", "subitem_identifier_uri": "http://dx.doi.org/10.1016/j.nimb.2013.05.077"}, {"subitem_identifier_type": "HDL", "subitem_identifier_uri": "http://hdl.handle.net/2237/20778"}]}, "item_10_publisher_32": {"attribute_name": "出版者", "attribute_value_mlt": [{"subitem_publisher": "Elsevier", "subitem_publisher_language": "en"}]}, "item_10_relation_11": {"attribute_name": "DOI", "attribute_value_mlt": [{"subitem_relation_type": "isVersionOf", "subitem_relation_type_id": {"subitem_relation_type_id_text": "https://doi.org/10.1016/j.nimb.2013.05.077", "subitem_relation_type_select": "DOI"}}]}, "item_10_rights_12": {"attribute_name": "権利", "attribute_value_mlt": [{"subitem_rights": "This is the author\u0027s version of a work that was accepted for publication in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms, may not be reflected in this document. Changes may have been made to this work since it was submitted for publication. A definitive version was subsequently published in Journal of Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. v.315, 2013, p.283–286, DOI:10.1016/j.nimb.2013.05.077.", "subitem_rights_language": "en"}]}, "item_10_select_15": {"attribute_name": "著者版フラグ", "attribute_value_mlt": [{"subitem_select_item": "author"}]}, "item_10_source_id_7": {"attribute_name": "ISSN", "attribute_value_mlt": [{"subitem_source_identifier": "0168-583X", "subitem_source_identifier_type": "PISSN"}]}, "item_1615787544753": {"attribute_name": "出版タイプ", "attribute_value_mlt": [{"subitem_version_resource": "http://purl.org/coar/version/c_ab4af688f83e57aa", "subitem_version_type": "AM"}]}, "item_access_right": {"attribute_name": "アクセス権", "attribute_value_mlt": [{"subitem_access_right": "open access", "subitem_access_right_uri": "http://purl.org/coar/access_right/c_abf2"}]}, "item_creator": {"attribute_name": "著者", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "Kawai, K.", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "54414", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Sakuma, Y.", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "54415", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Kato, M.", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "54416", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Soda, K.", "creatorNameLang": "en"}], "nameIdentifiers": [{"nameIdentifier": "54417", "nameIdentifierScheme": "WEKO"}]}]}, "item_files": {"attribute_name": "ファイル情報", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_date", "date": [{"dateType": "Available", "dateValue": "2018-02-21"}], "displaytype": "detail", "download_preview_message": "", "file_order": 0, "filename": "ICACS25_paper_Kawai.pdf", "filesize": [{"value": "535.0 kB"}], "format": "application/pdf", "future_date_message": "", "is_thumbnail": false, "licensetype": "license_note", "mimetype": "application/pdf", "size": 535000.0, "url": {"label": "ICACS25_paper_Kawai.pdf", "objectType": "fulltext", "url": "https://nagoya.repo.nii.ac.jp/record/18683/files/ICACS25_paper_Kawai.pdf"}, "version_id": "72caed1f-22f3-4da4-a631-b4eaf27102dd"}]}, "item_language": {"attribute_name": "言語", "attribute_value_mlt": [{"subitem_language": "eng"}]}, "item_resource_type": {"attribute_name": "資源タイプ", "attribute_value_mlt": [{"resourcetype": "journal article", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "Auger electron emission from a Si(111) surface during 11-keV Ar+ ion sputtering", "item_titles": {"attribute_name": "タイトル", "attribute_value_mlt": [{"subitem_title": "Auger electron emission from a Si(111) surface during 11-keV Ar+ ion sputtering", "subitem_title_language": "en"}]}, "item_type_id": "10", "owner": "1", "path": ["322"], "permalink_uri": "http://hdl.handle.net/2237/20778", "pubdate": {"attribute_name": "PubDate", "attribute_value": "2014-11-14"}, "publish_date": "2014-11-14", "publish_status": "0", "recid": "18683", "relation": {}, "relation_version_is_last": true, "title": ["Auger electron emission from a Si(111) surface during 11-keV Ar+ ion sputtering"], "weko_shared_id": -1}