{"_buckets": {"deposit": "97fbb7f9-369a-4bb9-beb2-f95d6350e339"}, "_deposit": {"created_by": 17, "id": "2001588", "owner": "17", "owners": [17], "owners_ext": {"displayname": "\u56f3\u66f8\u60c5\u5831\u4fc2", "username": "repository"}, "pid": {"revision_id": 0, "type": "depid", "value": "2001588"}, "status": "published"}, "_oai": {"id": "oai:nagoya.repo.nii.ac.jp:02001588", "sets": []}, "author_link": [], "control_number": "2001588", "item_1615768549627": {"attribute_name": "\u51fa\u7248\u30bf\u30a4\u30d7", "attribute_value_mlt": [{"subitem_version_resource": "http://purl.org/coar/version/c_970fb48d4fbd8a85", "subitem_version_type": "VoR"}]}, "item_1629683748249": {"attribute_name": "\u65e5\u4ed8", "attribute_value_mlt": [{"subitem_date_issued_datetime": "2022-03-03", "subitem_date_issued_type": "Available"}]}, "item_9_biblio_info_6": {"attribute_name": "\u66f8\u8a8c\u60c5\u5831", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2021-03-03", "bibliographicIssueDateType": "Issued"}, "bibliographicIssueNumber": "9", "bibliographicPageStart": "093502", "bibliographicVolumeNumber": "118", "bibliographic_titles": [{"bibliographic_title": "Applied Physics Letters", "bibliographic_titleLang": "en"}]}]}, "item_9_description_4": {"attribute_name": "\u5185\u5bb9\u8a18\u8ff0", "attribute_value_mlt": [{"subitem_description": "Herein, we propose and demonstrate the edge termination for GaN-based one-sided abrupt p\u2013n junctions. The structure is comprised of a combination of a shallow negative bevel mesa and selective-area p-type doping under the mesa. Based on the Technology Computer Aided Design (TCAD) simulation, the maximum electric field at the junction edge is markedly reduced to approximately 1.3 times that of the parallel-plane electric field in the proposed structure, which is almost half of the unimplanted diode. The TCAD simulation also shows that the shallow mesa angle of 6\u00b0 effectively reduces the optimum acceptor concentration (Na) in the implanted region and enhances the breakdown voltage. The optimum Na value can be covered by the proposed technology based on the Mg-ion implantation and subsequent ultra-high-pressure annealing (UHPA). Using the formation of the shallow bevel mesa, the Mg-ion implantation, and the UHPA process, we experimentally demonstrate the p\u2013n diodes with a breakdown voltage over 600\u2009V, which is in good agreement with the TCAD simulation. The proposed method can be applied to a vertical trench-gate metal-oxide-semiconductor field-effect transistor with a high figure-of-merit.", "subitem_description_language": "en", "subitem_description_type": "Abstract"}]}, "item_9_publisher_32": {"attribute_name": "\u51fa\u7248\u8005", "attribute_value_mlt": [{"subitem_publisher": "AIP Publishing", "subitem_publisher_language": "en"}]}, "item_9_relation_43": {"attribute_name": "\u95a2\u9023\u60c5\u5831", "attribute_value_mlt": [{"subitem_relation_type": "isVersionOf", "subitem_relation_type_id": {"subitem_relation_type_id_text": "https://doi.org/10.1063/5.0039183", "subitem_relation_type_select": "DOI"}}]}, "item_9_rights_12": {"attribute_name": "\u6a29\u5229", "attribute_value_mlt": [{"subitem_rights": "Copyright 2021 Author(s). Published under an exclusive license by AIP Publishing. This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing.The following article appeared in (Appl. Phys. Lett. 118, 093502 (2021)) and may be found at (https://doi.org/10.1063/5.0039183).", "subitem_rights_language": "en"}]}, "item_9_source_id_7": {"attribute_name": "\u53ce\u9332\u7269\u8b58\u5225\u5b50", "attribute_value_mlt": [{"subitem_source_identifier": "0003-6951", "subitem_source_identifier_type": "PISSN"}]}, "item_access_right": {"attribute_name": "\u30a2\u30af\u30bb\u30b9\u6a29", "attribute_value_mlt": [{"subitem_access_right": "open access", "subitem_access_right_uri": "http://purl.org/coar/access_right/c_abf2"}]}, "item_creator": {"attribute_name": "\u8457\u8005", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "Matys, Maciej", "creatorNameLang": "en"}]}, {"creatorNames": [{"creatorName": "Ishida, Takashi", "creatorNameLang": "en"}]}, {"creatorNames": [{"creatorName": "Nam Kyung Pil", "creatorNameLang": "en"}]}, {"creatorNames": [{"creatorName": "Sakurai, Hideki", "creatorNameLang": "en"}]}, {"creatorNames": [{"creatorName": "Narita, Tetsuo", "creatorNameLang": "en"}]}, {"creatorNames": [{"creatorName": "Uesugi, Tsutomu", "creatorNameLang": "en"}]}, {"creatorNames": [{"creatorName": "Bockowski, Michal", "creatorNameLang": "en"}]}, {"creatorNames": [{"creatorName": "Suda, Jun", "creatorNameLang": "en"}]}, {"creatorNames": [{"creatorName": "Kachi, Tetsu", "creatorNameLang": "en"}]}]}, "item_files": {"attribute_name": "\u30d5\u30a1\u30a4\u30eb\u60c5\u5831", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_date", "date": [{"dateType": "Available", "dateValue": "2022-03-03"}], "displaytype": "detail", "download_preview_message": "", "file_order": 0, "filename": "5_0039183.pdf", "filesize": [{"value": "1.8 MB"}], "format": "application/pdf", "future_date_message": "", "is_thumbnail": false, "mimetype": "application/pdf", "size": 1800000.0, "url": {"objectType": "fulltext", "url": "https://nagoya.repo.nii.ac.jp/record/2001588/files/5_0039183.pdf"}, "version_id": "19fe6aca-4d1d-47a0-831d-8e10d97b5d38"}]}, "item_language": {"attribute_name": "\u8a00\u8a9e", "attribute_value_mlt": [{"subitem_language": "eng"}]}, "item_resource_type": {"attribute_name": "\u8cc7\u6e90\u30bf\u30a4\u30d7", "attribute_value_mlt": [{"resourcetype": "journal article", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "Mg-implanted bevel edge termination structure for GaN power device applications", "item_titles": {"attribute_name": "\u30bf\u30a4\u30c8\u30eb", "attribute_value_mlt": [{"subitem_title": "Mg-implanted bevel edge termination structure for GaN power device applications", "subitem_title_language": "en"}]}, "item_type_id": "40001", "owner": "17", "path": ["673/674/675"], "permalink_uri": "http://hdl.handle.net/2237/0002001588", "pubdate": {"attribute_name": "PubDate", "attribute_value": "2021-11-11"}, "publish_date": "2021-11-11", "publish_status": "0", "recid": "2001588", "relation": {}, "relation_version_is_last": true, "title": ["Mg-implanted bevel edge termination structure for GaN power device applications"], "weko_shared_id": -1}