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  1. B200 工学部/工学研究科
  2. B200a 雑誌掲載論文
  3. 学術雑誌

Novel Wet Anisotropic Etching Process for the Realization of New Shapes of Silicon MEMS Structures

http://hdl.handle.net/2237/9437
http://hdl.handle.net/2237/9437
00cbfdc7-4b9e-496b-9d1e-2ff026def832
名前 / ファイル ライセンス アクション
sato_499.pdf sato_499.pdf (4.1 MB)
Item type 学術雑誌論文 / Journal Article(1)
公開日 2008-02-21
タイトル
タイトル Novel Wet Anisotropic Etching Process for the Realization of New Shapes of Silicon MEMS Structures
言語 en
著者 Pal, Prem

× Pal, Prem

WEKO 21873

en Pal, Prem

Search repository
Sato, Kazuo

× Sato, Kazuo

WEKO 21874

en Sato, Kazuo

Search repository
Gosalvez, Miguel A.

× Gosalvez, Miguel A.

WEKO 21875

en Gosalvez, Miguel A.

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Shikida, Mitsuhiro

× Shikida, Mitsuhiro

WEKO 21876

en Shikida, Mitsuhiro

Search repository
アクセス権
アクセス権 open access
アクセス権URI http://purl.org/coar/access_right/c_abf2
権利
言語 en
権利情報 Copyright © 2007 IEEE. Reprinted from (relevant publication info). This material is posted here with permission of the IEEE. Such permission of the IEEE does not in any way imply IEEE endorsement of any of Nagoya University’s products or services. Internal or personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution must be obtained from the IEEE by writing to pubs-permissions@ieee.org.
抄録
内容記述 In this work, we have developed a novel anisotropic wet etching process for the fabrication of MEMS microstructures with rounded concave and sharp convex corners, grooves for chip isolation, mesa structures with bent V-grooves, and 45°mirrors by using a single etching mask. Tetra Methyl Ammonium Hydroxide (TMAH) at various concentrations with and without the non-ionic surfactant NC-200 at 0.1% of the total volume of the etchant has been used. In order to fabricate the microstructures with rounded concave corners, round shape mask pattern was used. Mesa structures and grooves for chip isolation were realized using spatially efficient convex corner compensation structures.
言語 en
内容記述タイプ Abstract
出版者
言語 en
出版者 IEEE
言語
言語 eng
資源タイプ
資源タイプresource http://purl.org/coar/resource_type/c_6501
タイプ journal article
出版タイプ
出版タイプ VoR
出版タイプResource http://purl.org/coar/version/c_970fb48d4fbd8a85
DOI
関連タイプ isVersionOf
識別子タイプ DOI
関連識別子 https://doi.org/10.1109/MHS.2007.4420906
ISBN
関連タイプ isPartOf
識別子タイプ ISBN
関連識別子 978-1-4244-1858-9
書誌情報 en : International Symposium on Micro-NanoMechatronics and Human Science

p. 499-504, 発行日 2007
フォーマット
application/pdf
著者版フラグ
値 publisher
URI
識別子 http://hdl.handle.net/2237/9437
識別子タイプ HDL
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