{"_buckets": {"deposit": "3d2cafe4-3502-43bb-9835-bf0b2b5ec5c9"}, "_deposit": {"created_by": 17, "id": "2002040", "owner": "17", "owners": [17], "owners_ext": {"displayname": "\u56f3\u66f8\u60c5\u5831\u4fc2", "username": "repository"}, "pid": {"revision_id": 0, "type": "depid", "value": "2002040"}, "status": "published"}, "_oai": {"id": "oai:nagoya.repo.nii.ac.jp:02002040", "sets": []}, "author_link": [], "item_1615768549627": {"attribute_name": "\u51fa\u7248\u30bf\u30a4\u30d7", "attribute_value_mlt": [{"subitem_version_resource": "http://purl.org/coar/version/c_ab4af688f83e57aa", "subitem_version_type": "AM"}]}, "item_1629683748249": {"attribute_name": "\u65e5\u4ed8", "attribute_value_mlt": [{"subitem_date_issued_datetime": "2022-11-01", "subitem_date_issued_type": "Available"}]}, "item_9_biblio_info_6": {"attribute_name": "\u66f8\u8a8c\u60c5\u5831", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2021-11", "bibliographicIssueDateType": "Issued"}, "bibliographicIssueNumber": "SF", "bibliographicPageStart": "SFFB13", "bibliographicVolumeNumber": "60", "bibliographic_titles": [{"bibliographic_title": "Japanese Journal of Applied Physics", "bibliographic_titleLang": "en"}]}]}, "item_9_description_4": {"attribute_name": "\u5185\u5bb9\u8a18\u8ff0", "attribute_value_mlt": [{"subitem_description": "Recently, we reported linear electro-optic (EO) effects in (100)-epitaxial yttrium-doped hafnium dioxide (Y-HfO2) ferroelectric thin films. In this study, we have investigated the influence of orientation on the EO effect in Y-HfO2 thin-film. (111)-epitaxial undoped HfO2 and Y-HfO2 films were deposited on Sn-doped In2O3/yttria-stabilized zirconia (111) substrates at room temperature through radiofrequency magnetron sputtering. Although the undoped HfO2 film showed typical paraelectric characteristics, ferroelectricity was observed in the (111)-Y-HfO2 film. Remnant polarization in the (111)-Y-HfO2 film was higher than that in the (100)-Y-HfO2 film. The (111)-Y-HfO2 film exhibited a linear EO effect based on ferroelectricity, which is consistent with that of the (100)-Y-HfO2 film. The average EO coefficient rc of the (111)-Y-HfO2 film was 0.67 pm V^\u22121, which is higher than that of the (100)-Y-HfO2 film. This result is reasonable considering the difference in remnant polarization between the (100)-Y-HfO2 and (111)-Y-HfO2 films.", "subitem_description_language": "en", "subitem_description_type": "Abstract"}, {"subitem_description": "\u201cThis Accepted Manuscript is available for reuse under a CC BY-NC-ND licence after the 12 month embargo period provided that all the terms of the licence are adhered to\u201d", "subitem_description_language": "en", "subitem_description_type": "Abstract"}]}, "item_9_publisher_32": {"attribute_name": "\u51fa\u7248\u8005", "attribute_value_mlt": [{"subitem_publisher": "IOP publishing", "subitem_publisher_language": "en"}]}, "item_9_relation_43": {"attribute_name": "\u95a2\u9023\u60c5\u5831", "attribute_value_mlt": [{"subitem_relation_type": "isVersionOf", "subitem_relation_type_id": {"subitem_relation_type_id_text": "https://doi.org/10.35848/1347-4065/ac17e0", "subitem_relation_type_select": "DOI"}}]}, "item_9_rights_12": {"attribute_name": "\u6a29\u5229", "attribute_value_mlt": [{"subitem_rights": "This is the Accepted Manuscript version of an article accepted for publication in [Japanese Journal of Applied Physics]. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it.\u202fThe Version of Record is available online at [10.35848/1347-4065/ac17e0]", "subitem_rights_language": "en"}]}, "item_9_source_id_7": {"attribute_name": "\u53ce\u9332\u7269\u8b58\u5225\u5b50", "attribute_value_mlt": [{"subitem_source_identifier": "0021-4922", "subitem_source_identifier_type": "PISSN"}]}, "item_access_right": {"attribute_name": "\u30a2\u30af\u30bb\u30b9\u6a29", "attribute_value_mlt": [{"subitem_access_right": "embargoed access", "subitem_access_right_uri": "http://purl.org/coar/access_right/c_f1cf"}]}, "item_creator": {"attribute_name": "\u8457\u8005", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "Kondo, Shinya", "creatorNameLang": "en"}]}, {"creatorNames": [{"creatorName": "Shimura, Reijiro", "creatorNameLang": "en"}]}, {"creatorNames": [{"creatorName": "Teranishi, Takashi", "creatorNameLang": "en"}]}, {"creatorNames": [{"creatorName": "Kishimoto, Akira", "creatorNameLang": "en"}]}, {"creatorNames": [{"creatorName": "Nagasaki, Takanori", "creatorNameLang": "en"}]}, {"creatorNames": [{"creatorName": "Funakubo, Hiroshi", "creatorNameLang": "en"}]}, {"creatorNames": [{"creatorName": "Yamada, Tomoaki", "creatorNameLang": "en"}]}]}, "item_files": {"attribute_name": "\u30d5\u30a1\u30a4\u30eb\u60c5\u5831", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_date", "date": [{"dateType": "Available", "dateValue": "2022-11-01"}], "displaytype": "detail", "download_preview_message": "Download / Preview is available from 2022/10/31.", "file_order": 0, "filename": "FMA_JJAP_HfO2_S.Kondo_revised_final_2.pdf", "filesize": [{"value": "7.3 MB"}], "format": "application/pdf", "future_date_message": "Download is available from 2022/10/31.", "is_thumbnail": false, "mimetype": "application/pdf", "size": 7300000.0, "url": {"objectType": "fulltext", "url": "https://nagoya.repo.nii.ac.jp/record/2002040/files/FMA_JJAP_HfO2_S.Kondo_revised_final_2.pdf"}, "version_id": "1e079098-6442-4ebe-811c-8497eef0462a"}]}, "item_language": {"attribute_name": "\u8a00\u8a9e", "attribute_value_mlt": [{"subitem_language": "eng"}]}, "item_resource_type": {"attribute_name": "\u8cc7\u6e90\u30bf\u30a4\u30d7", "attribute_value_mlt": [{"resourcetype": "journal article", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "Influence of orientation on the electro-optic effect in epitaxial Y-doped HfO2 ferroelectric thin films", "item_titles": {"attribute_name": "\u30bf\u30a4\u30c8\u30eb", "attribute_value_mlt": [{"subitem_title": "Influence of orientation on the electro-optic effect in epitaxial Y-doped HfO2 ferroelectric thin films", "subitem_title_language": "en"}]}, "item_type_id": "40001", "owner": "17", "path": ["320/321/322"], "permalink_uri": "http://hdl.handle.net/2237/0002002040", "pubdate": {"attribute_name": "PubDate", "attribute_value": "2022-02-07"}, "publish_date": "2022-02-07", "publish_status": "0", "recid": "2002040", "relation": {}, "relation_version_is_last": true, "title": ["Influence of orientation on the electro-optic effect in epitaxial Y-doped HfO2 ferroelectric thin films"], "weko_shared_id": -1}