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Study on plasma etching of GaN at high temperatures for damageless fabrication of next-generation power devices
http://hdl.handle.net/2237/26580
http://hdl.handle.net/2237/26580f1153414-7b96-4c57-b0a3-11cd31340f92
名前 / ファイル | ライセンス | アクション |
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k11890_thesis.pdf (4.1 MB)
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k11890_abstract.pdf (210.0 kB)
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k11890_review.pdf (106.3 kB)
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Item type | 学位論文 / Thesis or Dissertation(1) | |||||
---|---|---|---|---|---|---|
公開日 | 2017-06-06 | |||||
タイトル | ||||||
タイトル | Study on plasma etching of GaN at high temperatures for damageless fabrication of next-generation power devices | |||||
言語 | en | |||||
その他のタイトル | ||||||
その他のタイトル | 次世代パワーデバイスにおける窒化ガリウムの低ダメージ加工に向けた高温プラズマエッチングに関する研究 | |||||
言語 | ja | |||||
著者 |
LIU, Zecheng
× LIU, Zecheng× 劉, 沢鋮 |
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アクセス権 | ||||||
アクセス権 | open access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源 | http://purl.org/coar/resource_type/c_db06 | |||||
タイプ | doctoral thesis | |||||
書誌情報 |
発行日 2017-03-27 |
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学位名 | ||||||
言語 | ja | |||||
学位名 | 博士(工学) | |||||
学位授与機関 | ||||||
学位授与機関識別子Scheme | kakenhi | |||||
学位授与機関識別子 | 13901 | |||||
言語 | ja | |||||
学位授与機関名 | 名古屋大学 | |||||
言語 | en | |||||
学位授与機関名 | Nagoya University | |||||
学位授与年度 | ||||||
学位授与年度 | 2016 | |||||
学位授与年月日 | ||||||
学位授与年月日 | 2017-03-27 | |||||
学位授与番号 | ||||||
学位授与番号 | 甲第11890号 | |||||
著者版フラグ | ||||||
値 | ETD | |||||
URI | ||||||
識別子 | http://hdl.handle.net/2237/26580 | |||||
識別子タイプ | HDL |