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  1. B200 工学部/工学研究科
  2. B200d 学位論文
  3. 博士論文(工博・論工博)

Study on plasma etching of GaN at high temperatures for damageless fabrication of next-generation power devices

http://hdl.handle.net/2237/26580
http://hdl.handle.net/2237/26580
f1153414-7b96-4c57-b0a3-11cd31340f92
名前 / ファイル ライセンス アクション
k11890_thesis.pdf k11890_thesis.pdf (4.1 MB)
k11890_abstract.pdf k11890_abstract.pdf (210.0 kB)
k11890_review.pdf k11890_review.pdf (106.3 kB)
Item type 学位論文 / Thesis or Dissertation(1)
公開日 2017-06-06
タイトル
タイトル Study on plasma etching of GaN at high temperatures for damageless fabrication of next-generation power devices
言語 en
その他のタイトル
その他のタイトル 次世代パワーデバイスにおける窒化ガリウムの低ダメージ加工に向けた高温プラズマエッチングに関する研究
言語 ja
著者 LIU, Zecheng

× LIU, Zecheng

WEKO 71680

en LIU, Zecheng

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劉, 沢鋮

× 劉, 沢鋮

WEKO 71681

ja 劉, 沢鋮

Search repository
アクセス権
アクセス権 open access
アクセス権URI http://purl.org/coar/access_right/c_abf2
言語
言語 eng
資源タイプ
資源 http://purl.org/coar/resource_type/c_db06
タイプ doctoral thesis
書誌情報
発行日 2017-03-27
学位名
言語 ja
学位名 博士(工学)
学位授与機関
学位授与機関識別子Scheme kakenhi
学位授与機関識別子 13901
言語 ja
学位授与機関名 名古屋大学
言語 en
学位授与機関名 Nagoya University
学位授与年度
学位授与年度 2016
学位授与年月日
学位授与年月日 2017-03-27
学位授与番号
学位授与番号 甲第11890号
著者版フラグ
値 ETD
URI
識別子 http://hdl.handle.net/2237/26580
識別子タイプ HDL
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