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  1. B200 工学部/工学研究科
  2. B200a 雑誌掲載論文
  3. 学術雑誌

Spatial profiles of interelectrode electron density in direct current superposed dual-frequency capacitively coupled plasmas

http://hdl.handle.net/2237/26587
http://hdl.handle.net/2237/26587
d5e1f7fe-69cd-495e-8d45-e95ed4a0a9d5
名前 / ファイル ライセンス アクション
paper_ohya_acceptedmanuscript.pdf paper_ohya_acceptedmanuscript.pdf ファイル公開:2018/04/01 (806.7 kB)
Item type 学術雑誌論文 / Journal Article(1)
公開日 2017-06-07
タイトル
タイトル Spatial profiles of interelectrode electron density in direct current superposed dual-frequency capacitively coupled plasmas
言語 en
著者 Ohya, Yoshinobu

× Ohya, Yoshinobu

WEKO 72196

en Ohya, Yoshinobu

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Ishikawa, Kenji

× Ishikawa, Kenji

WEKO 72197

en Ishikawa, Kenji

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Komuro, Tatsuya

× Komuro, Tatsuya

WEKO 72198

en Komuro, Tatsuya

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Yamaguchi, Tsuyoshi

× Yamaguchi, Tsuyoshi

WEKO 72199

en Yamaguchi, Tsuyoshi

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Takeda, Keigo

× Takeda, Keigo

WEKO 72200

en Takeda, Keigo

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Kondo, Hiroki

× Kondo, Hiroki

WEKO 72201

en Kondo, Hiroki

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Sekine, Makoto

× Sekine, Makoto

WEKO 72202

en Sekine, Makoto

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Hori, Masaru

× Hori, Masaru

WEKO 72203

en Hori, Masaru

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アクセス権
アクセス権 open access
アクセス権URI http://purl.org/coar/access_right/c_abf2
権利
言語 en
権利情報 “This is an author-created, un-copyedited version of an article accepted for publication/published in [Journal of Physics D: Applied Physics]. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at [https://doi.org/10.1088/1361-6463/aa60f7]”
抄録
内容記述 We present experimentally determined spatial profiles of the interelectrode electron density (n e) in dual-frequency capacitively coupled plasmas in which the negative direct current (dc) bias voltage (V dc) is superposed; in the experiment, 13 MHz (P low) was applied to the lower electrode and 60 MHz (P high) to the upper electrode. The bulk n e increased substantially with increases in the external power, P high, P low, and with increases in V dc. When P low was insufficient, the bulk n e decreased as the V dc bias increased. The bulk n e increased due to its dependence on V dc, especially for |V dc|  >  500 V. This may correspond to the sheath voltages (V s) of the lower electrode. The n e values in front of the upper electrode were coupled with the V dc: the V dc dependence first decreased and then increased. The dc currents (I dc) of the upper electrode were collected when a large P low was applied. The value of I dc at the threshold value of V dc  ≈  V s (e.g.  −500 V) increased with an increase in n e. When |V dc| exceeded the threshold, the spatial n e profile and the I dc dependence were changed relative to the electrical characteristics of the dc superposition; this led to a change in the location of the maximum n e, the width of the area of n e depletion in front of the electrodes, and a transition in the electron heating modes.
言語 en
内容記述タイプ Abstract
出版者
言語 en
出版者 IOP publishing
言語
言語 eng
資源タイプ
資源タイプresource http://purl.org/coar/resource_type/c_6501
タイプ journal article
出版タイプ
出版タイプ AM
出版タイプResource http://purl.org/coar/version/c_ab4af688f83e57aa
DOI
関連タイプ isVersionOf
識別子タイプ DOI
関連識別子 https://doi.org/10.1088/1361-6463/aa60f7
ISSN
収録物識別子タイプ PISSN
収録物識別子 0022-3727
書誌情報 en : Journal of Physics D: Applied Physics

巻 50, 号 15, p. 155201-155201, 発行日 2017-04
著者版フラグ
値 author
URI
識別子 https://doi.org/10.1088/1361-6463/aa60f7
識別子タイプ DOI
URI
識別子 http://hdl.handle.net/2237/26587
識別子タイプ HDL
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