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Buckling and postbuckling of etching-induced wiggling in a bilayer structure with intrinsic compressive stress
http://hdl.handle.net/2237/00028547
http://hdl.handle.net/2237/0002854798fa1a50-e8e8-49b8-9e20-af5be1f976c6
名前 / ファイル | ライセンス | アクション |
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2018-09-10 | |||||
タイトル | ||||||
タイトル | Buckling and postbuckling of etching-induced wiggling in a bilayer structure with intrinsic compressive stress | |||||
言語 | en | |||||
著者 |
Okumura, Dai
× Okumura, Dai× Sugiura, Junya× Tanaka, Hiro× Shibutani, Yoji |
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アクセス権 | ||||||
アクセス権 | open access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||
権利 | ||||||
言語 | en | |||||
権利情報 | © 2018. This manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/ | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Wiggling | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Etching | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Bilayer structure | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Buckling | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Postbuckling | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Finite element analysis | |||||
抄録 | ||||||
内容記述 | In this study, we investigate buckling and postbuckling of etching-induced wiggling in a bilayer structure consisting of mask and masked layers. To show effects of explicit modeling of etching process, two mask–masked ridge models with and without etching (Models w/E and w/oE) are analyzed using finite element analysis. The etching process is explicitly introduced via step-by-step eigenvalue buckling analysis. Although Model w/oE predicts a constant value of the critical wavelength of wiggling regardless of the change in ridge width, Model w/E predicts a shorter wavelength depending on the decrease in ridge width and the increase in intrinsic compressive stress in the mask layer. In postbuckling analysis, Model w/oE predicts a monotonic increase in the wiggling amplitude with the constant wavelength, whereas Model w/E predicts saturation of the wiggling amplitude owing to the decreasing wavelength. In the explicit modeling of etching process, the wiggling behavior shows completely opposite tendencies. Dimensional analysis is performed to obtain empirical equations, which are compared with an experiment. | |||||
言語 | en | |||||
内容記述タイプ | Abstract | |||||
内容記述 | ||||||
内容記述 | ファイル公開:2020-06-01 | |||||
言語 | ja | |||||
内容記述タイプ | Other | |||||
出版者 | ||||||
言語 | en | |||||
出版者 | Elsevier | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプresource | http://purl.org/coar/resource_type/c_6501 | |||||
タイプ | journal article | |||||
出版タイプ | ||||||
出版タイプ | AM | |||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||
DOI | ||||||
関連タイプ | isVersionOf | |||||
識別子タイプ | DOI | |||||
関連識別子 | https://doi.org/10.1016/j.ijmecsci.2018.03.032 | |||||
ISSN(print) | ||||||
収録物識別子タイプ | PISSN | |||||
収録物識別子 | 0020-7403 | |||||
書誌情報 |
en : International Journal of Mechanical Sciences 巻 141, p. 78-88, 発行日 2018-06 |
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著者版フラグ | ||||||
値 | author |