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Evaluation of absolute charge density at the bottom of high aspect capillary holes exposed to a pulsed very high frequency plasma
http://hdl.handle.net/2237/00032720
http://hdl.handle.net/2237/00032720c1a19544-900d-4f10-ac45-aae9d2cea9a9
名前 / ファイル | ライセンス | アクション |
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VHF_Chargeup__Moriyama_20200319 (565.9 kB)
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2020-10-13 | |||||
タイトル | ||||||
タイトル | Evaluation of absolute charge density at the bottom of high aspect capillary holes exposed to a pulsed very high frequency plasma | |||||
言語 | en | |||||
著者 |
Moriyama, Makoto
× Moriyama, Makoto× Nakahara, Naoya× Mitsuya, Akihiro× Suzuki, Haruka× Kurihara, Kazuaki× Iino, Daiki× Fukumizu, Hiroyuki× Toyoda, Hirotaka |
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アクセス権 | ||||||
アクセス権 | open access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||
権利 | ||||||
言語 | en | |||||
権利情報 | This is an author-created, un-copyedited version of an article published in {Japanese Journal of Applied Physics}. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at {https://doi.org/10.35848/1347-4065/ab85af}. “This Accepted Manuscript is available for reuse under a CC BY-NC-ND 4.0 licence after the 12 month embargo period provided that all the terms of the licence are adhered to” | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | high-aspect hole | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | charge-up | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | VHF plasma | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | charge density | |||||
抄録 | ||||||
内容記述 | Absolute values of the surface charge densities at the top and bottom of a capillary plate (CP) placed on a powered electrode were evaluated under the influence of pulse-modulated very high frequency (40 MHz) plasma. The peak-to-peak voltage at the top and bottom of the CP was measured using a high-voltage probe; this voltage was carefully calibrated, removing the influence of probe impedance. Based on the peak-to-peak voltage, the capacitances of the sheath and the CP were evaluated. Based on the average voltage, the surface charge density was evaluated for the plasma-on and off phases. A charge density of the order of 10^−5 C m^−2 was obtained at the bottom of the CP. Furthermore, two important observations were made during the plasma-off phase, namely: conservation of the surface charge density at the bottom of the CP and presence of the residual negative surface charge at the top of the CP. | |||||
言語 | en | |||||
内容記述タイプ | Abstract | |||||
内容記述 | ||||||
内容記述 | ファイル公開:2021-06-01 | |||||
言語 | ja | |||||
内容記述タイプ | Other | |||||
出版者 | ||||||
言語 | en | |||||
出版者 | IOP publishing | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプresource | http://purl.org/coar/resource_type/c_6501 | |||||
タイプ | journal article | |||||
出版タイプ | ||||||
出版タイプ | AM | |||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||
DOI | ||||||
関連タイプ | isVersionOf | |||||
識別子タイプ | DOI | |||||
関連識別子 | https://doi.org/10.35848/1347-4065/ab85af | |||||
ISSN(print) | ||||||
収録物識別子タイプ | PISSN | |||||
収録物識別子 | 0021-4922 | |||||
書誌情報 |
en : Japanese Journal of Applied Physics 巻 59, 号 SJ, p. SJJB03, 発行日 2020-06 |
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著者版フラグ | ||||||
値 | author |