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  1. B200 工学部/工学研究科
  2. B200a 雑誌掲載論文
  3. 学術雑誌

Evaluation of absolute charge density at the bottom of high aspect capillary holes exposed to a pulsed very high frequency plasma

http://hdl.handle.net/2237/00032720
http://hdl.handle.net/2237/00032720
c1a19544-900d-4f10-ac45-aae9d2cea9a9
名前 / ファイル ライセンス アクション
VHF_Chargeup__Moriyama_20200319.pdf VHF_Chargeup__Moriyama_20200319 (565.9 kB)
Item type 学術雑誌論文 / Journal Article(1)
公開日 2020-10-13
タイトル
タイトル Evaluation of absolute charge density at the bottom of high aspect capillary holes exposed to a pulsed very high frequency plasma
言語 en
著者 Moriyama, Makoto

× Moriyama, Makoto

WEKO 101623

en Moriyama, Makoto

Search repository
Nakahara, Naoya

× Nakahara, Naoya

WEKO 101624

en Nakahara, Naoya

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Mitsuya, Akihiro

× Mitsuya, Akihiro

WEKO 101625

en Mitsuya, Akihiro

Search repository
Suzuki, Haruka

× Suzuki, Haruka

WEKO 101626

en Suzuki, Haruka

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Kurihara, Kazuaki

× Kurihara, Kazuaki

WEKO 101627

en Kurihara, Kazuaki

Search repository
Iino, Daiki

× Iino, Daiki

WEKO 101628

en Iino, Daiki

Search repository
Fukumizu, Hiroyuki

× Fukumizu, Hiroyuki

WEKO 101629

en Fukumizu, Hiroyuki

Search repository
Toyoda, Hirotaka

× Toyoda, Hirotaka

WEKO 101630

en Toyoda, Hirotaka

Search repository
アクセス権
アクセス権 open access
アクセス権URI http://purl.org/coar/access_right/c_abf2
権利
言語 en
権利情報 This is an author-created, un-copyedited version of an article published in {Japanese Journal of Applied Physics}. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at {https://doi.org/10.35848/1347-4065/ab85af}. “This Accepted Manuscript is available for reuse under a CC BY-NC-ND 4.0 licence after the 12 month embargo period provided that all the terms of the licence are adhered to”
キーワード
主題Scheme Other
主題 high-aspect hole
キーワード
主題Scheme Other
主題 charge-up
キーワード
主題Scheme Other
主題 VHF plasma
キーワード
主題Scheme Other
主題 charge density
抄録
内容記述 Absolute values of the surface charge densities at the top and bottom of a capillary plate (CP) placed on a powered electrode were evaluated under the influence of pulse-modulated very high frequency (40 MHz) plasma. The peak-to-peak voltage at the top and bottom of the CP was measured using a high-voltage probe; this voltage was carefully calibrated, removing the influence of probe impedance. Based on the peak-to-peak voltage, the capacitances of the sheath and the CP were evaluated. Based on the average voltage, the surface charge density was evaluated for the plasma-on and off phases. A charge density of the order of 10^−5 C m^−2 was obtained at the bottom of the CP. Furthermore, two important observations were made during the plasma-off phase, namely: conservation of the surface charge density at the bottom of the CP and presence of the residual negative surface charge at the top of the CP.
言語 en
内容記述タイプ Abstract
内容記述
内容記述 ファイル公開:2021-06-01
言語 ja
内容記述タイプ Other
出版者
言語 en
出版者 IOP publishing
言語
言語 eng
資源タイプ
資源タイプresource http://purl.org/coar/resource_type/c_6501
タイプ journal article
出版タイプ
出版タイプ AM
出版タイプResource http://purl.org/coar/version/c_ab4af688f83e57aa
DOI
関連タイプ isVersionOf
識別子タイプ DOI
関連識別子 https://doi.org/10.35848/1347-4065/ab85af
ISSN(print)
収録物識別子タイプ PISSN
収録物識別子 0021-4922
書誌情報 en : Japanese Journal of Applied Physics

巻 59, 号 SJ, p. SJJB03, 発行日 2020-06
著者版フラグ
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