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  1. B200 工学部/工学研究科
  2. B200a 雑誌掲載論文
  3. 学術雑誌

Novel process for SiO_2/Si selective etching using a novel gas source for preventing global warming

http://hdl.handle.net/2237/7076
http://hdl.handle.net/2237/7076
8236c26f-09c5-4693-abdc-ab4e5ccd6139
名前 / ファイル ライセンス アクション
JVB000957.pdf JVB000957.pdf (199.2 kB)
Item type 学術雑誌論文 / Journal Article(1)
公開日 2006-10-26
タイトル
タイトル Novel process for SiO_2/Si selective etching using a novel gas source for preventing global warming
言語 en
著者 Fujita, Kazushi

× Fujita, Kazushi

WEKO 14111

en Fujita, Kazushi

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Ito, Masafumi

× Ito, Masafumi

WEKO 14112

en Ito, Masafumi

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Hori, Masaru

× Hori, Masaru

WEKO 14113

en Hori, Masaru

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Goto, Toshio

× Goto, Toshio

WEKO 14114

en Goto, Toshio

Search repository
アクセス権
アクセス権 open access
アクセス権URI http://purl.org/coar/access_right/c_abf2
権利
言語 en
権利情報 Copyright (1999) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.
抄録
内容記述 A novel gas source replacing fluorocarbon feed gases has been developed for preventing global warming. The novel gas source was designed to generate fluorocarbon species from polytetrafluoroethylene by CO_2 laser ablation. The species generated from the gas source were introduced into an electron cyclotron resonance (ECR) plasma employing Ar gases. To characterize the gas source, CF_x (x=1–3) radical densities with and without plasmas were measured by infrared diode laser absorption spectroscopy. In the ECR plasma employing the novel gas source, CF_x (x =1–3) radical densities were estimated to be of the order of 10^12–10^13 cm^-3. The gas source has been applied to the selective etching of SiO_2 to Si using the ECR plasma. As a result, the etching characteristics by ECR plasma employing the novel gas source were equivalent to those by a conventional ECR plasma employing C_4F_8 gas. Therefore, this novel gas source is applicable to etching processes for preventing global warming.
言語 en
内容記述タイプ Abstract
出版者
言語 en
出版者 American Institute of Physics
言語
言語 eng
資源タイプ
資源タイプresource http://purl.org/coar/resource_type/c_6501
タイプ journal article
出版タイプ
出版タイプ VoR
出版タイプResource http://purl.org/coar/version/c_970fb48d4fbd8a85
DOI
関連タイプ isVersionOf
識別子タイプ DOI
関連識別子 https://doi.org/10.1116/1.590676
ISSN
収録物識別子タイプ PISSN
収録物識別子 1071-1023
書誌情報 en : Journal of Vacuum Science & Technology B

巻 17, 号 3, p. 957-960, 発行日 1999-05
フォーマット
application/pdf
著者版フラグ
値 publisher
URI
識別子 http://hdl.handle.net/2237/7076
識別子タイプ HDL
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