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  1. B200 工学部/工学研究科
  2. B200d 学位論文
  3. 博士論文(工博・論工博)

Formation of functional SiO:CH thin films by plasma enhanced chemical vapor deposition

http://hdl.handle.net/2237/9689
2f81b407-6aa0-4079-926d-29e89f9057b0
名前 / ファイル ライセンス アクション
all.pdf all.pdf (21.0 MB)
Item type 学位論文 / Thesis or Dissertation(1)
公開日 2008-04-17
タイトル
タイトル Formation of functional SiO:CH thin films by plasma enhanced chemical vapor deposition
著者 尹, 龍燮

× 尹, 龍燮

WEKO 22696

尹, 龍燮

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Yun, yongsup

× Yun, yongsup

WEKO 22697

Yun, yongsup

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内容記述
内容記述 名古屋大学博士学位論文 学位の種類:博士(工学) 学位授与年月日:平成19年12月28日
内容記述タイプ Other
言語
言語 eng
資源タイプ
資源 http://purl.org/coar/resource_type/c_46ec
タイプ thesis
書誌情報 発行日 2007-12-28
学位授与年度
学位授与年度 2007
学位授与年月日
学位授与年月日 2007-12-28
学位授与番号
学位授与番号 13901甲第7698号
フォーマット
application/pdf
著者版フラグ
値 publisher
URI
識別子 http://hdl.handle.net/2237/9689
識別子タイプ HDL
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