{"_buckets": {"deposit": "6778d9a2-e6bb-4f15-a5cd-d84238098cd1"}, "_deposit": {"id": "21447", "owners": [], "pid": {"revision_id": 0, "type": "depid", "value": "21447"}, "status": "published"}, "_oai": {"id": "oai:nagoya.repo.nii.ac.jp:00021447"}, "item_10_alternative_title_19": {"attribute_name": "\u305d\u306e\u4ed6\u306e\u8a00\u8a9e\u306e\u30bf\u30a4\u30c8\u30eb", "attribute_value_mlt": [{"subitem_alternative_title": "Control of Interfacial Reactions in HfO_2 Atomic-Layer-Deposition on Ge(100) and Post-deposition Anneal with Ultrathin TiO_x Capping on Ge(100)"}]}, "item_10_biblio_info_6": {"attribute_name": "\u66f8\u8a8c\u60c5\u5831", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2011-06-27", "bibliographicIssueDateType": "Issued"}, "bibliographicIssueNumber": "114", "bibliographicPageEnd": "50", "bibliographicPageStart": "47", "bibliographicVolumeNumber": "111", "bibliographic_titles": [{"bibliographic_title": "\u96fb\u5b50\u60c5\u5831\u901a\u4fe1\u5b66\u4f1a\u6280\u8853\u7814\u7a76\u5831\u544a. SDM, \u30b7\u30ea\u30b3\u30f3\u6750\u6599\u30fb\u30c7\u30d0\u30a4\u30b9"}]}]}, "item_10_description_4": {"attribute_name": "\u6284\u9332", "attribute_value_mlt": [{"subitem_description": "High-k/Ge\u754c\u9762\u5236\u5fa1\u624b\u6cd5\u3068\u3057\u3066\u3001\u6975\u8584TiO_2\u5c64\u306e\u633f\u5165\u306b\u7740\u76ee\u3057\u3001\u5869\u9178\u51e6\u7406\u3057\u305fGe(100)\u8868\u9762\u4e0a\u3078\u306eTiO_2\u306e\u539f\u5b50\u5c64\u5236\u5fa1CVD\u3092\u691c\u8a0e\u3057\u305f\u3002\u3055\u3089\u306b\u3001\u8a98\u96fb\u7387\u4f4e\u4e0b\u306e\u8981\u56e0\u3068\u306a\u308bGe\u754c\u9762\u9178\u5316\u5c64\u306e\u5f62\u6210\u306e\u6291\u5236\u3092\u76ee\u6307\u3057\u3001TEMAT\u932f\u4f53\u306e\u98fd\u548c\u5438\u7740\u3068\u71b1\u5206\u89e3\u306e\u7e70\u308a\u8fd4\u3057\u306b\u3088\u308a\u6975\u8584\u4f4e\u9178\u5316TiO_x(x\u003c2)\u5c64\u3092Ge(100)\u57fa\u677f\u4e0a\u306b\u5f62\u6210\u5f8c\u3001HfO_2\u5c64\u3092\u539f\u5b50\u5c64\u5236\u5fa1\u5806\u7a4d\u3057\u305f\u3002\u71b1\u51e6\u7406\u524d\u5f8c\u3067X\u7dda\u5149\u96fb\u5b50\u5206\u5149\u6cd5(XPS)\u3092\u7528\u3044\u3066\u754c\u9762\u53cd\u5fdc\u3092\u8a55\u4fa1\u3057\u305f\u7d50\u679c\u3001\u539a\u3055\u301c2nm\u4ee5\u4e0a\u306eTiO_x\u633f\u5165\u306b\u3088\u308aHfO_2\u819c\u4e2d\u3078\u306e\u9855\u8457\u306aGe\u539f\u5b50\u306e\u62e1\u6563\u3092\u6291\u5236\u53ef\u80fd\u3067\u3042\u308b\u3053\u3068\u3092\u660e\u3089\u304b\u3068\u3057\u305f\u3002To control interfacial reaction between high-k dielectric and Ge(100) we focused on insertion of TiO_x ultrathin layer with a high permittivity(\u03b5: 50-80) as a interfacial barrier layer and studied atomic-layer controlled CVD process of TiO_2 on HC1-treated Ge(100). In order to suppress the growth of GeO_x layer with a low permittivity during the formation of high-k dielectric such as HfO_2, TiO_x (x\u003c2) ultrathin layers were formed on Ge(100) by repeating saturated adsorption of TEMAT and its thermal decomposition. X-ray photoelectron spectroscopy after HfO_2 layer formation on TiO_x/Ge(100) show that Ge atoms diffusion in the HfO_2 layer is efficiently suppressed by inserting TiO_x thicker than 2nm.", "subitem_description_type": "Abstract"}]}, "item_10_identifier_60": {"attribute_name": "URI", "attribute_value_mlt": [{"subitem_identifier_type": "URI", "subitem_identifier_uri": "http://ci.nii.ac.jp/naid/110008800854/"}, {"subitem_identifier_type": "HDL", "subitem_identifier_uri": "http://hdl.handle.net/2237/23580"}]}, "item_10_publisher_32": {"attribute_name": "\u51fa\u7248\u8005", "attribute_value_mlt": [{"subitem_publisher": "\u4e00\u822c\u793e\u56e3\u6cd5\u4eba\u96fb\u5b50\u60c5\u5831\u901a\u4fe1\u5b66\u4f1a"}]}, "item_10_rights_12": {"attribute_name": "\u6a29\u5229", "attribute_value_mlt": [{"subitem_rights": "(c)\u4e00\u822c\u793e\u56e3\u6cd5\u4eba\u96fb\u5b50\u60c5\u5831\u901a\u4fe1\u5b66\u4f1a \u672c\u6587\u30c7\u30fc\u30bf\u306f\u5b66\u5354\u4f1a\u306e\u8a31\u8afe\u306b\u57fa\u3065\u304dCiNii\u304b\u3089\u8907\u88fd\u3057\u305f\u3082\u306e\u3067\u3042\u308b"}]}, "item_10_select_15": {"attribute_name": "\u8457\u8005\u7248\u30d5\u30e9\u30b0", "attribute_value_mlt": [{"subitem_select_item": "publisher"}]}, "item_10_source_id_7": {"attribute_name": "ISSN", "attribute_value_mlt": [{"subitem_source_identifier": "09135685", "subitem_source_identifier_type": "ISSN"}]}, "item_creator": {"attribute_name": "\u8457\u8005", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "\u6751\u4e0a, \u79c0\u6a39"}], "nameIdentifiers": [{"nameIdentifier": "62294", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "\u85e4\u5ca1, \u77e5\u5b8f"}], "nameIdentifiers": [{"nameIdentifier": "62295", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "\u5927\u7530, \u6643\u751f"}], "nameIdentifiers": [{"nameIdentifier": "62296", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "\u4e09\u5d8b, \u5065\u6597"}], "nameIdentifiers": [{"nameIdentifier": "62297", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "\u6771, \u6e05\u4e00\u90ce"}], "nameIdentifiers": [{"nameIdentifier": "62298", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "\u5bae\u5d0e, \u8aa0\u4e00"}], "nameIdentifiers": [{"nameIdentifier": "62299", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "MURAKAMI, Hideki"}], "nameIdentifiers": [{"nameIdentifier": "62300", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "FUJIOKA, Tomohiro"}], "nameIdentifiers": [{"nameIdentifier": "62301", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "OHTA, Akio"}], "nameIdentifiers": [{"nameIdentifier": "62302", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "MISHIMA, Kento"}], "nameIdentifiers": [{"nameIdentifier": "62303", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "HIGASHI, Seiichiro"}], "nameIdentifiers": [{"nameIdentifier": "62304", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "MIYAZAKI, Seiichi"}], "nameIdentifiers": [{"nameIdentifier": "62305", "nameIdentifierScheme": "WEKO"}]}]}, "item_files": {"attribute_name": "\u30d5\u30a1\u30a4\u30eb\u60c5\u5831", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_date", "date": [{"dateType": "Available", "dateValue": "2018-02-21"}], "displaytype": "detail", "download_preview_message": "", "file_order": 0, "filename": "110008800854.pdf", "filesize": [{"value": "674.1 kB"}], "format": "application/pdf", "future_date_message": "", "is_thumbnail": false, "licensetype": "license_free", "mimetype": "application/pdf", "size": 674100.0, "url": {"label": "110008800854.pdf", "url": "https://nagoya.repo.nii.ac.jp/record/21447/files/110008800854.pdf"}, "version_id": "0e0efaeb-8828-46bf-b9c1-ae7d96e05600"}]}, "item_keyword": {"attribute_name": "\u30ad\u30fc\u30ef\u30fc\u30c9", "attribute_value_mlt": [{"subitem_subject": "Ge\u30c1\u30e3\u30cd\u30eb", "subitem_subject_scheme": "Other"}, {"subitem_subject": "ALD", "subitem_subject_scheme": "Other"}, {"subitem_subject": "\u754c\u9762\u53cd\u5fdc", "subitem_subject_scheme": "Other"}, {"subitem_subject": "\u5316\u5b66\u7d50\u5408\u72b6\u614b", "subitem_subject_scheme": "Other"}, {"subitem_subject": "X\u7dda\u5149\u96fb\u5b50\u5206\u5149\u6cd5", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Ge-Channel", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Atomic Layer Deposition", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Interfacial Reaction", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Chemical Bonding Feature", "subitem_subject_scheme": "Other"}, {"subitem_subject": "X-ray Photoelectron Spectroscopy (XPS)", "subitem_subject_scheme": "Other"}]}, "item_language": {"attribute_name": "\u8a00\u8a9e", "attribute_value_mlt": [{"subitem_language": "jpn"}]}, "item_resource_type": {"attribute_name": "\u8cc7\u6e90\u30bf\u30a4\u30d7", "attribute_value_mlt": [{"resourcetype": "journal article", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "Ge(100)\u8868\u9762\u306e\u6975\u8584TiO_x\u30ad\u30e3\u30c3\u30d4\u30f3\u30b0\u306b\u3088\u308bHfO_2\u539f\u5b50\u5c64\u5806\u7a4d/\u71b1\u51e6\u7406\u6642\u306e\u754c\u9762\u53cd\u5fdc\u5236\u5fa1(\u30b2\u30fc\u30c8\u7d76\u7e01\u8584\u819c,\u5bb9\u91cf\u819c,\u6a5f\u80fd\u819c\u53ca\u3073\u30e1\u30e2\u30ea\u6280\u8853)", "item_titles": {"attribute_name": "\u30bf\u30a4\u30c8\u30eb", "attribute_value_mlt": [{"subitem_title": "Ge(100)\u8868\u9762\u306e\u6975\u8584TiO_x\u30ad\u30e3\u30c3\u30d4\u30f3\u30b0\u306b\u3088\u308bHfO_2\u539f\u5b50\u5c64\u5806\u7a4d/\u71b1\u51e6\u7406\u6642\u306e\u754c\u9762\u53cd\u5fdc\u5236\u5fa1(\u30b2\u30fc\u30c8\u7d76\u7e01\u8584\u819c,\u5bb9\u91cf\u819c,\u6a5f\u80fd\u819c\u53ca\u3073\u30e1\u30e2\u30ea\u6280\u8853)"}]}, "item_type_id": "10", "owner": "1", "path": ["320/321/322"], "permalink_uri": "http://hdl.handle.net/2237/23580", "pubdate": {"attribute_name": "\u516c\u958b\u65e5", "attribute_value": "2016-02-24"}, "publish_date": "2016-02-24", "publish_status": "0", "recid": "21447", "relation": {}, "relation_version_is_last": true, "title": ["Ge(100)\u8868\u9762\u306e\u6975\u8584TiO_x\u30ad\u30e3\u30c3\u30d4\u30f3\u30b0\u306b\u3088\u308bHfO_2\u539f\u5b50\u5c64\u5806\u7a4d/\u71b1\u51e6\u7406\u6642\u306e\u754c\u9762\u53cd\u5fdc\u5236\u5fa1(\u30b2\u30fc\u30c8\u7d76\u7e01\u8584\u819c,\u5bb9\u91cf\u819c,\u6a5f\u80fd\u819c\u53ca\u3073\u30e1\u30e2\u30ea\u6280\u8853)"], "weko_shared_id": null}