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Computational study on SiH4 dissociation channels and H abstraction reactions
http://hdl.handle.net/2237/26333
http://hdl.handle.net/2237/263339a616c7b-1a95-48a5-8610-3793f98fd246
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
Preprint_of_JJApRegular_Papers_2014_55_7_07LD07.pdf ファイル公開：2017/07/01 (1.0 MB)
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| Item type | 学術雑誌論文 / Journal Article(1) | |||||
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| 公開日 | 2017-05-17 | |||||
| タイトル | ||||||
| タイトル | Computational study on SiH4 dissociation channels and H abstraction reactions | |||||
| 言語 | en | |||||
| 著者 |
Hayashi, Toshio
× Hayashi, Toshio× Ishikawa, Kenji× Sekine, Makoto× Hori, Masaru |
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| アクセス権 | ||||||
| アクセス権 | open access | |||||
| アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||
| 権利 | ||||||
| 言語 | en | |||||
| 権利情報 | © 2016 The Japan Society of Applied Physics | |||||
| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | The primary dissociation channels of SiH4 were investigated using computational chemistry. The results showed properties very similar to those of CH4. The main dissociation product was SiH2 and the second dissociation product was SiH3. SiH was produced through SiH3 to SiH + H2 dissociation by electronic excitation. H abstraction reactions by H and SiH3 were also calculated for SiH4, Si2H6, Si3H8, and Si9H14(100) cluster models. The energy barriers of H abstraction reactions were lower than those of SiH3 abstraction reactions. This result is considerably important for deposition in SiH4/H2 process plasma. | |||||
| 言語 | en | |||||
| 出版者 | ||||||
| 出版者 | IOP publishing | |||||
| 言語 | en | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| 資源タイプ | ||||||
| 資源タイプresource | http://purl.org/coar/resource_type/c_6501 | |||||
| タイプ | journal article | |||||
| 出版タイプ | ||||||
| 出版タイプ | AM | |||||
| 出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||
| DOI | ||||||
| 関連タイプ | isVersionOf | |||||
| 識別子タイプ | DOI | |||||
| 関連識別子 | https://doi.org/10.7567/JJAP.55.07LD07 | |||||
| ISSN | ||||||
| 収録物識別子タイプ | PISSN | |||||
| 収録物識別子 | 0021-4922 | |||||
| 書誌情報 |
en : Japanese Journal of Applied Physics 巻 55, 号 7S2, p. 07LD07-07LD07, 発行日 2016-07 |
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| 著者版フラグ | ||||||
| 値 | author | |||||
| URI | ||||||
| 識別子 | https://doi.org/10.7567/JJAP.55.07LD07 | |||||
| 識別子タイプ | DOI | |||||
| URI | ||||||
| 識別子 | http://hdl.handle.net/2237/26333 | |||||
| 識別子タイプ | HDL | |||||
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Cite as
Hayashi, Toshio, Ishikawa, Kenji, Sekine, Makoto, Hori, Masaru, 2016, Computational study on SiH4 dissociation channels and H abstraction reactions: IOP publishing, 07LD07–07LD07 p.
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