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Reduction of threading dislocation density in SiGe layers on Si (001) using a two-step strain–relaxation procedure
http://hdl.handle.net/2237/6996
d0fc8ea8-df98-4da0-87b0-ee3fa8fa7674
名前 / ファイル | ライセンス | アクション | |
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2006-10-20 | |||||
タイトル | ||||||
タイトル | Reduction of threading dislocation density in SiGe layers on Si (001) using a two-step strain–relaxation procedure | |||||
著者 |
Sakai, Akira
× Sakai, Akira× Sugimoto, Ken× Yamamoto, Takeo× Okada, Masahisa× Ikeda, Hiroya× Yasuda, Yukio× Zaima, Shigeaki |
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権利 | ||||||
権利情報 | Copyright (2001) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. | |||||
抄録 | ||||||
内容記述 | A method to obtain high-quality strain–relaxed SiGe buffer layers on Si(001) substrates is presented. In this method, the strain relaxation of the SiGe layer is performed using a two-step procedure. Firstly, a low-temperature-grown SiGe layer, whose surface is covered by a thin Si cap layer, is thermally annealed. At this stage, the strain is incompletely relaxed and an atomically flat surface can be realized. Then, a second SiGe layer is grown on the first layer to achieve further strain relaxation. Transmission electron microscopy has clearly revealed that dislocations are dispersively introduced into the first SiGe/Si substrate interface and thus no pile up of dislocations occurs. The formation of a periodic undulation on the growth surface of the second SiGe layer is the key to inducing a drastic reduction in the threading dislocation density. |
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内容記述タイプ | Abstract | |||||
出版者 | ||||||
出版者 | American Institute of Physics | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプresource | http://purl.org/coar/resource_type/c_6501 | |||||
タイプ | journal article | |||||
DOI | ||||||
関連識別子 | ||||||
識別子タイプ | DOI | |||||
関連識別子 | http://dx.doi.org/10.1063/1.1419037 | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 0003-6951 | |||||
書誌情報 |
Applied Physics Letters 巻 79, 号 21, p. 3398-3400, 発行日 2001-11-19 |
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application/pdf | ||||||
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値 | publisher | |||||
URI | ||||||
識別子 | http://hdl.handle.net/2237/6996 | |||||
識別子タイプ | HDL |