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Effects of H, OH, and CH_3 radicals on diamond film formation in parallel-plate radio frequency plasma reactor
http://hdl.handle.net/2237/7026
http://hdl.handle.net/2237/7026b7946da5-de24-4732-8601-4dba11e3b789
名前 / ファイル | ライセンス | アクション |
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JApplPhys_82_4055.pdf (334.4 kB)
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2006-10-23 | |||||
タイトル | ||||||
タイトル | Effects of H, OH, and CH_3 radicals on diamond film formation in parallel-plate radio frequency plasma reactor | |||||
言語 | en | |||||
著者 |
Ikeda, M.
× Ikeda, M.× Ito, H.× Hiramatsu, M.× Hori, M.× Goto, T. |
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アクセス権 | ||||||
アクセス権 | open access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||
権利 | ||||||
言語 | en | |||||
権利情報 | Copyright (1997) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. | |||||
抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | Diamond films were successfully synthesized in both parallel-plate radio frequency (rf: 13.56 MHz) CH_4 and CH_3OH plasmas with injection of H and OH radicals generated in the remote microwave (2.45 GHz) H_2 /H_2O plasma. Effects of H, OH, and CH_3 radicals on the diamond film formation in the rf plasma reactor were investigated by the formation of diamond films employing radical injection technique and the measurement of density in the plasma. Under the condition of diamond film formation, CH_3 density was measured by infrared diode laser absorption spectroscopy (IRLAS). The kinetics of CH_3 in rf CH_4 and CH_3OH plasmas with injection of H and OH radicals were evaluated from the results of optical emission spectroscopy and lifetime of CH_3 radicals estimated by IRLAS. | |||||
言語 | en | |||||
出版者 | ||||||
出版者 | American Institute of Physics | |||||
言語 | en | |||||
言語 | ||||||
言語 | eng | |||||
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資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
出版タイプ | ||||||
出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
DOI | ||||||
関連タイプ | isVersionOf | |||||
識別子タイプ | DOI | |||||
関連識別子 | https://doi.org/10.1063/1.365715 | |||||
ISSN | ||||||
収録物識別子タイプ | PISSN | |||||
収録物識別子 | 0021-8979 | |||||
書誌情報 |
en : Journal of Applied Physics 巻 82, 号 8, p. 4055-4061, 発行日 1997-10-15 |
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値 | application/pdf | |||||
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値 | publisher | |||||
URI | ||||||
識別子 | http://hdl.handle.net/2237/7026 | |||||
識別子タイプ | HDL |